SCHEMBL17536596

SCHEMBL17536596

C=COCC1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4804213 0.70
SCHEMBL6281495 0.69
SCHEMBL9389988 0.63 TSHR (0.32)
SCHEMBL3241075 0.61
SCHEMBL23611422 0.59
SCHEMBL7734472 0.58
SCHEMBL521318 0.58 PDE9A (0.31)
SCHEMBL3107747 0.58
SCHEMBL8728838 0.57
SCHEMBL8725777 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113056492-B Copolymers of perfluoroalicyclic methyl vinyl ethers 3M创新有限公司 2023-01-06 CN disclosed
CN-113056492-A Copolymers of perfluoroalicyclic methyl vinyl ethers 3M创新有限公司 2021-06-29 CN disclosed
US-9746775-B2 Method for manufacturing substrate having concave pattern, composition, method for forming conductive film, electronic circuit and electronic device JSR CORPORATION (JP) 2017-08-29 US disclosed
EP-2993519-A1 METHOD FOR MANUFACTURING BASE MATERIAL HAVING RECESSED PATTERN, COMPOSITION, METHOD FOR FORMING ELECTRICALLY CONDUCTIVE FILM, ELECTRONIC CIRCUIT AND ELECTRONIC DEVICE JSR Corporation (JP) 2016-03-09 EP disclosed
US-20160062242-A1 METHOD FOR MANUFACTURING SUBSTRATE HAVING CONCAVE PATTERN, COMPOSITION, METHOD FOR FORMING CONDUCTIVE FILM, ELECTRONIC CIRCUIT AND ELECTRONIC DEVICE JSR CORPORATION (JP) 2016-03-03 US disclosed