SCHEMBL17548740

SCHEMBL17548740

CCC(C)C(=O)OCCOC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.43
CA2 P00918 3/20 0.43
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17548668 0.98 CA1 (0.45) CA1CA2THRB
SCHEMBL17548747 0.95 CA1 (0.38) CA1CA2
SCHEMBL13556126 0.88 CA1 (0.31) CA1CA2
SCHEMBL17548673 0.87 MMP8 (0.34) CA1CA2
SCHEMBL18648116 0.87 CA1 (0.32) CA1CA2
SCHEMBL17548669 0.86 GAA (0.34) CA1CA2
SCHEMBL17548749 0.86 CA1 (0.32) CA1CA2
SCHEMBL16683584 0.85 CA1 (0.46) CA1CA2THRB
SCHEMBL17548738 0.84 GAA (0.32) CA1CA2
SCHEMBL17548672 0.84 CA1 (0.31) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9638996-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-05-02 US disclosed
US-9547240-B2 Resin, photoresist composition, and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-01-17 US disclosed
US-20160062234-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-03 US disclosed