Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17548753 | 0.95 | CYP19A1 (0.34) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL17545744 | 0.89 | CYP19A1 (0.34) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL13556146 | 0.88 | CYP19A1 (0.34) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL13556142 | 0.86 | CYP17A1 (0.33) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL17545758 | 0.84 | CYP19A1 (0.36) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL17545741 | 0.84 | CYP19A1 (0.38) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL17548754 | 0.83 | CYP19A1 (0.36) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL13556141 | 0.82 | CYP19A1 (0.33) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL25525745 | 0.81 | CYP19A1 (0.37) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL17545787 | 0.81 | CYP17A1 (0.33) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9599897-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9547240-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-01-17 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |