Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17548753 | 0.88 | CYP19A1 (0.34) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL13556146 | 0.88 | CYP19A1 (0.34) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL13556141 | 0.87 | CYP19A1 (0.33) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL17548756 | 0.86 | CYP17A1 (0.33) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL2625598 | 0.83 | CYP19A1 (0.36) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL16769837 | 0.81 | LMNA (0.34) | ALDH1A1 | |
| SCHEMBL13556145 | 0.81 | CYP17A1 (0.33) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 | |
| SCHEMBL2625693 | 0.80 | THRB (0.36) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL14226586 | 0.79 | CYP17A1 (0.31) | CYP17A1CYP19A1 | |
| SCHEMBL13556139 | 0.79 | PRKCA (0.38) | CYP17A1CYP19A1ALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180113382-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-26 | — | — | US | disclosed |
| US-9951159-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-24 | — | — | US | disclosed |
| US-20180031969-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-9880466-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-30 | — | — | US | disclosed |
| US-9869930-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9857683-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-02 | — | — | US | disclosed |
| US-9822060-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-21 | — | — | US | disclosed |
| US-9809669-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-07 | — | — | US | disclosed |
| US-9771346-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-26 | — | — | US | disclosed |
| US-20150248052-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20150212407-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150212408-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150168828-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20150153644-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-04 | — | — | US | disclosed |
| US-20150147695-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150118619-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150064622-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-05 | — | — | US | disclosed |
| US-20120270153-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180113382-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, FRG1, C1R | CYP17A1 1701/4885CYP19A1 1890/4885ALDH1A1 2924/4885 |
| US-20150248052-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | RER1, HRH4, H1-4 | CYP17A1 2978/4885CYP19A1 1522/4885ALDH1A1 732/4885 |
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | PSMB10, PUF60, RARA | CYP17A1 2018/4885CYP19A1 1904/4885ALDH1A1 665/4885 |
| US-20120270153-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | RER1, FRG1, ELOVL1 | CYP17A1 1224/4885CYP19A1 569/4885ALDH1A1 301/4885 |
| US-20150212407-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | HAX1, XBP1, AP1S1 | CYP17A1 1294/4885CYP19A1 1582/4885ALDH1A1 4593/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.