SCHEMBL17553254

SCHEMBL17553254

CC([SiH3])c1ccc(Cl)cc1F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.44
▸ TP53 P04637 1/20 0.44
▸ HTT P42858 1/20 0.44
▸ CXCR3 P49682 1/20 0.38
▸ MDM2 Q00987 1/20 0.38
▸ KCNH2 Q12809 3/20 0.37
▸ PSEN1 P49768 2/20 0.37
▸ PSEN2 P49810 2/20 0.37
▸ APH1B Q8WW43 2/20 0.37
▸ NCSTN Q92542 2/20 0.37
▸ APH1A Q96BI3 2/20 0.37
▸ PSENEN Q9NZ42 2/20 0.37
▸ OPRM1 P35372 3/20 0.36
▸ S1PR3 Q99500 3/20 0.35
▸ S1PR1 P21453 2/20 0.35
▸ PDE2A O00408 2/20 0.35
▸ HTR2A P28223 1/20 0.35
▸ SLC6A4 P31645 1/20 0.35
▸ DPP4 P27487 1/20 0.34
▸ DPP7 Q9UHL4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17553249 0.85 PSEN1 (0.41) LMNATP53HTTKCNH2PSEN1
SCHEMBL84107 0.83 LMNA (0.47) LMNATP53HTTCXCR3MDM2
SCHEMBL29618236 0.81 HTT (0.45) LMNATP53HTTCXCR3MDM2
SCHEMBL19816520 0.81 HTT (0.45) LMNATP53HTTCXCR3MDM2
SCHEMBL16046022 0.79 LMNA (0.64) LMNATP53HTTCXCR3MDM2
SCHEMBL29924355 0.79 PDE2A (0.46) LMNATP53HTTCXCR3MDM2
SCHEMBL8284264 0.79 LMNA (0.64) LMNATP53HTTCXCR3MDM2
SCHEMBL30399466 0.79 PDE2A (0.46) LMNATP53HTTCXCR3MDM2
SCHEMBL2295810 0.79 PDE2A (0.46) LMNATP53HTTCXCR3MDM2
SCHEMBL17215353 0.79 PDE2A (0.46) LMNATP53HTTCXCR3MDM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 — — US disclosed
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