⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6325275 | 0.69 | — | — | |
| SCHEMBL162489 | 0.67 | — | — | |
| SCHEMBL2163483 | 0.67 | — | — | |
| SCHEMBL461610 | 0.67 | — | — | |
| SCHEMBL6414129 | 0.67 | — | — | |
| SCHEMBL5823405 | 0.67 | — | — | |
| SCHEMBL15055824 | 0.67 | — | — | |
| SCHEMBL6415994 | 0.67 | — | — | |
| SCHEMBL99074 | 0.67 | — | — | |
| SCHEMBL5823406 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9650451-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-05-16 | — | — | US | claimed |
| US-8691491-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-04-08 | — | — | US | claimed |
| US-20130309614-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-21 | — | — | US | claimed |
| US-20110196121-A1 | Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-11 | — | — | US | claimed |
| CN-100417954-C | Antireflection film, electromagnetic wave shielding light transmitting window material, gas discharge type light emitting panel, flat display panel, show window material and solar cell module | BRIDGESTONE CORP (JP) | 2008-09-10 | — | — | CN | claimed |
| CN-1894601-A | Antireflection film, electromagnetic wave shielding light transmitting window material, gas discharge type light emitting panel, flat display panel, show window material and solar cell module | BRIDGESTONE CORP (JP) | 2007-01-10 | — | — | CN | claimed |
| US-20060264591-A1 | Fluorine-containing compounds and their polymers useful for anti-relfection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-11-23 | — | — | US | claimed |
| US-7125943-B2 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-24 | — | — | US | claimed |
| US-20040106755-A1 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-03 | — | — | US | claimed |
| US-20240210825-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240166779-A1 | PHOTOCURABLE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-05-23 | — | — | US | disclosed |
| US-20240158541-A1 | PHOTOCURABLE COMPOSITION AND PATTERN-FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| WO-2024075535-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2024-04-11 | — | — | WO | disclosed |
| WO-2024071131-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-20060264591-A1 | Fluorine-containing compounds and their polymers useful for anti-relfection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-11-23 | — | — | US | disclosed |
| US-7125943-B2 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-24 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| US-6858760-B2 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040106755-A1 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-03 | — | — | US | disclosed |