⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL375067 | 0.74 | LMNA (0.37) | — | |
| SCHEMBL1999315 | 0.74 | LMNA (0.37) | — | |
| SCHEMBL375068 | 0.74 | LMNA (0.37) | — | |
| SCHEMBL1611542 | 0.73 | LMNA (0.32) | — | |
| SCHEMBL374953 | 0.72 | LMNA (0.35) | — | |
| SCHEMBL11769431 | 0.72 | LMNA (0.42) | — | |
| SCHEMBL1904446 | 0.72 | LMNA (0.42) | — | |
| SCHEMBL1904448 | 0.72 | LMNA (0.42) | — | |
| SCHEMBL374952 | 0.72 | LMNA (0.35) | — | |
| SCHEMBL10791767 | 0.72 | LMNA (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113777884-A | Photocurable composition and pattern forming method | 东京应化工业株式会社 | 2021-12-10 | — | — | CN | disclosed |
| CN-113777883-A | Photocurable composition and pattern forming method | 东京应化工业株式会社 | 2021-12-10 | — | — | CN | disclosed |
| US-6858760-B2 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |