⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1013554 | 1.00 | — | — | |
| SCHEMBL99073 | 1.00 | — | — | |
| SCHEMBL17356122 | 0.75 | — | — | |
| SCHEMBL7589489 | 0.75 | ALDH1A1 (0.39) | — | |
| SCHEMBL7589484 | 0.75 | ALDH1A1 (0.39) | — | |
| SCHEMBL15940374 | 0.67 | — | — | |
| SCHEMBL29272599 | 0.67 | ALDH1A1 (0.53) | — | |
| SCHEMBL5823406 | 0.67 | — | — | |
| SCHEMBL7591759 | 0.67 | — | — | |
| SCHEMBL7591758 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 267 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3345211-B1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE (FR) | 2025-12-10 | — | — | EP | claimed |
| CN-118661297-A | Adhesive for positive electrode plate, synthesis method thereof, positive electrode plate comprising adhesive, secondary battery and power utilization device | 宁德时代新能源科技股份有限公司 | 2024-09-17 | — | — | CN | claimed |
| WO-2024011371-A1 | BINDER FOR POSITIVE ELECTRODE PLATE AND SYNTHESIS METHOD THEREFOR, POSITIVE ELECTRODE PLATE COMPRISING SAME, SECONDARY BATTERY AND ELECTRIC DEVICE | 宁德时代新能源科技股份有限公司 | 2024-01-18 | — | — | WO | claimed |
| CN-107924842-B | Nitrogen-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-109796768-B | LED packaging material and preparation method thereof | 湖南七纬科技有限公司 | 2021-12-07 | — | — | CN | claimed |
| US-20190326126-A1 | METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES | AIR LIQUIDE ELECTRONICS U.S. LP | 2019-10-24 | — | — | US | claimed |
| US-10347498-B2 | Methods of minimizing plasma-induced sidewall damage during low K etch processes | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2019-07-09 | — | — | US | claimed |
| US-20180211845-A1 | METHODS OF MINIMIZING PLASMA-INDUCED SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2018-07-26 | — | — | US | claimed |
| US-20170110336-A1 | METHODS FOR MINIMIZING SIDEWALL DAMAGE DURING LOW K ETCH PROCESSES | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2017-04-20 | — | — | US | claimed |
| US-8697295-B2 | Nonaqueous electrolytic solution and nonaqueous electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2014-04-15 | — | — | US | claimed |
| US-6967236-B1 | Methods of processing and synthesizing electrically conductive polymers and precursors thereof to form electrically conductive polymers having high electrical conductivity | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-11-22 | — | — | US | claimed |
| EP-3345211-B1 | NITROGEN-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE (FR) | 2025-12-10 | — | — | EP | disclosed |
| EP-4658660-A1 | MACROCYCLIC OREXIN RECEPTOR AGONISTS AND USES THEREOF | Jazz Pharmaceuticals Ireland Limited (IE) | 2025-12-10 | — | — | EP | disclosed |
| WO-2025215153-A1 | PRMT5 INHIBITORS | Ryvu Therapeutics S.A. (PL) | 2025-10-16 | — | — | WO | disclosed |
| CN-119855704-A | Coated article and method for producing same | 信越化学工业株式会社 | 2025-04-18 | — | — | CN | disclosed |
| EP-0469262-A2 | Process for the preparation of insecticidal acaridical and nematicidal 2-aryl-5-(trifluoromethyl) pyrrole compounds | AMERICAN CYANAMID COMPANY (US) | 1992-02-05 | — | — | EP | disclosed |
| US-5068390-A | Chemical intermediates for insecticides, miticides and nematocides | AMERICAN CYANAMID COMPANY (US) | 1991-11-26 | — | — | US | disclosed |
| EP-0399949-A1 | Substituted aminoalkylphosphinic acids | CIBA-GEIGY AG (CH) | 1990-11-28 | — | — | EP | disclosed |
| US-4024292-A | Process for developing latent electrostatic images with ink | XEROX CORPORATION (US) | 1977-05-17 | — | — | US | disclosed |
| US-3954640-A | Electrostatic printing inks | XEROX CORPORATION (US) | 1976-05-04 | — | — | US | disclosed |