Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.35 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | PTP4A3 | O75365 | 1/20 | 0.30 |
| ▸ | PTP4A1 | Q93096 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10524566 | 0.81 | CYP3A4 (0.38) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL27719035 | 0.79 | TSHR (0.39) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL9286079 | 0.79 | CYP3A4 (0.37) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL177943 | 0.77 | CYP3A4 (0.48) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL11038017 | 0.76 | CYP3A4 (0.35) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL11038020 | 0.76 | CYP3A4 (0.35) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL5142904 | 0.76 | — | — | |
| SCHEMBL2774742 | 0.76 | — | — | |
| SCHEMBL1082749 | 0.76 | CYP3A4 (0.41) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL83817 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9650451-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9184461-B2 | Controlled radical copolymerization of fluorinated monomers by xanthate or trithiocarbonate | ARKEMA FRANCE (FR) | 2015-11-10 | — | — | US | disclosed |
| US-20140171584-A1 | Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-19 | — | — | US | disclosed |
| US-20140154611-A1 | CONTROLLED RADICAL COPOLYMERIZATION OF FLUORINATED MONOMERS BY XANTHATE OR TRITHIOCARBONATE | ECOLE NATIONALE SUPERIEURE DE CHIMIE DE MONTPELLIER (FR) | 2014-06-05 | — | — | US | disclosed |
| US-8691491-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-04-08 | — | — | US | disclosed |
| US-20110196121-A1 | Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-11 | — | — | US | disclosed |
| US-7947422-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-24 | — | — | US | disclosed |
| US-7781602-B2 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20080194764-A1 | Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| US-7232917-B2 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7105618-B2 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060194143-A1 | Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-08-31 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| US-20060057489-A1 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-03-16 | — | — | US | disclosed |
| US-6858760-B2 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040106755-A1 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-03 | — | — | US | disclosed |
| US-20030232940-A1 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2003-12-18 | — | — | US | disclosed |
| EP-0271212-B1 | PROCESS FOR PREPARATION OF CARBOXYLIC ACID ESTER CONTAINING FLUORINE | Tosoh Corporation (JP) | 1992-09-16 | — | — | EP | disclosed |
| EP-0271212-A2 | Process for preparation of carboxylic acid ester containing fluorine | Tosoh Corporation (JP) | 1988-06-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | PFAS, AFF1, FUBP1 | CYP3A4 2773/4885TSHR 3489/4885MAPT 3079/4885 |
| US-20110196121-A1 | Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | DNMT3B, DNMT3L, AFF1 | CYP3A4 4122/4885TSHR 1280/4885MAPT 2854/4885 |
| US-20030232940-A1 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | AFF1, AFF4, AFF2 | CYP3A4 3572/4885TSHR 1747/4885MAPT 2141/4885 |
| US-20080194764-A1 | Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same | PFAS, AFF1, AFF2 | CYP3A4 3028/4885TSHR 3349/4885MAPT 2840/4885 |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | AFF1, FPR1, AFF2 | CYP3A4 2608/4885TSHR 1278/4885MAPT 3202/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.