SCHEMBL17621

SCHEMBL17621

c1ccc(Cn2ccnc2-c2ccccc2)cc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.62
LIMK2 P53671 1/20 0.62
BRD4 O60885 2/20 0.59
ESR1 P03372 1/20 0.57
PDE6D O43924 1/20 0.50
ALDH1A1 P00352 3/20 0.48
MEN1 O00255 1/20 0.48
CYP1A2 P05177 1/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2D6 P10635 1/20 0.48
CYP2C9 P11712 1/20 0.48
ALOX12 P18054 1/20 0.48
CYP2C19 P33261 1/20 0.48
KMT2A Q03164 1/20 0.48
CYP19A1 P11511 1/20 0.47
LMNA P02545 2/20 0.47
HPGD P15428 1/20 0.47
HTT P42858 1/20 0.47
PLAA Q9Y263 1/20 0.47
HSP90AA1 P07900 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL28519464 0.98 HSD17B10 (0.60) HSD17B10LIMK2BRD4ESR1PDE6D
Fluoride SCHEMBL10339918 0.98 HSD17B10 (0.60) HSD17B10LIMK2BRD4ESR1PDE6D
Bromide SCHEMBL811908 0.98 HSD17B10 (0.60) HSD17B10LIMK2BRD4ESR1PDE6D
Hydrochloric Acid SCHEMBL233781 0.98 HSD17B10 (0.60) HSD17B10LIMK2BRD4ESR1PDE6D
Fluoride Ion SCHEMBL10906965 0.96 LIMK2 (0.59) HSD17B10LIMK2BRD4ESR1PDE6D
SCHEMBL5981532 0.96 LIMK2 (0.63) HSD17B10LIMK2BRD4ESR1PDE6D
Fluoride SCHEMBL10906966 0.96 LIMK2 (0.59) HSD17B10LIMK2BRD4ESR1PDE6D
Bromide SCHEMBL811907 0.96 LIMK2 (0.59) HSD17B10LIMK2BRD4ESR1PDE6D
SCHEMBL10906967 0.93 LIMK2 (0.56) HSD17B10LIMK2BRD4ESR1PDE6D
SCHEMBL2840217 0.91 LIMK2 (0.58) HSD17B10LIMK2BRD4ESR1PDE6D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5302 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122051120-A Preparation method of petroleum coke-resin-based hard carbon composite anode material, sodium ion battery and application of sodium ion battery 天宏基科技(深圳)有限公司 2026-05-15 CN claimed
US-20250333594-A1 RESIN COMPOSITION NAN YA PLASTICS CORPORATION (TW) 2025-10-30 US claimed
US-20250188268-A1 SHEET MOLDING COMPOUND AND FIBER-REINFORCED COMPOSITE MATERIAL MITSUBISHI CHEMICAL CORPORATION (JP) 2025-06-12 US claimed
US-20250163261-A1 LOW-DIELECTRIC RESIN COMPOSITION NAN YA PLASTICS CORPORATION (TW) 2025-05-22 US claimed
CN-120005486-A Low dielectric resin composition 南亚塑胶工业股份有限公司 2025-05-16 CN claimed
CN-119859370-A Cycloolefin resin composition and composite material thereof 道生天合材料科技(上海)股份有限公司 2025-04-22 CN claimed
CN-119371920-A Single-component epoxy adhesive for magnetic core adhesion 成都拓利科技股份有限公司 2025-01-28 CN claimed
CN-119371903-A High-heat-conductivity composite film and preparation method thereof 昆山雅森电子材料科技有限公司 2025-01-28 CN claimed
CN-119119894-A Metal composite film and lithium ion battery 上海恩捷新材料科技有限公司 2024-12-13 CN claimed
WO-2024248496-A1 ADHESIVE MATERIAL COMPOSITION OF FLEXIBLE SUBSTRATE FOR AUTOMOTIVE ELECTRONIC PARTS 오컴퍼니 주식회사 2024-12-05 WO claimed
US-20040171817-A1 Novel dye complexes and use thereof in imaging members and methods ZINK HOLDINGS LLC 2004-09-02 US claimed
US-6558812-B2 Adherent to the surface of silicon flip chips, especially polyimide resins and nitride films; shock resistance SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-05-06 US claimed
US-6534193-B2 Containing a low molecular weight indene-styrene or indene-chroman-styrene copolymer; semiconductor device sealed with the cured product of the liquid epoxy resin SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-03-18 US claimed
US-20020089071-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-07-11 US claimed
US-20020077421-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-06-20 US claimed
US-20020045709-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-18 US claimed
US-5985954-A POLYDIMETHYLSILOXANE MODIFIED WITH ETHYLENE OXIDE-PROPYLENE OXIDE AND EPOXY RESIN HTIACHI CHEMICAL COMPANY, LTD. (JP) 1999-11-16 US claimed
US-5179210-A PREPARATION OF N-SUBSTITUTED IMIDAZOLES BASF AKTIENGESELLSCHAFT (DE) 1993-01-12 US claimed
EP-0130454-B1 PROCESS FOR THE PREPARATION OF MOULDING MASSES FROM REACTIVE RESINS SIEMENS AKTIENGESELLSCHAFT (DE) 1989-11-08 EP claimed
EP-0130454-A2 Process for the preparation of moulding masses from reactive resins SIEMENS AKTIENGESELLSCHAFT (DE) 1985-01-09 EP claimed