Carbon Monoxide

Carbon Monoxide

SCHEMBL176325

[C]=O.[C]=O.[C]=O.[Ru]C1=CC=CC1

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Carbon Monoxide SCHEMBL514001 1.00
Carbon Monoxide SCHEMBL7997719 1.00
Carbon Monoxide SCHEMBL8450099 1.00
Carbon Monoxide SCHEMBL4297935 1.00
SCHEMBL588101 0.91
Carbon Monoxide SCHEMBL8008061 0.90
Formaldehyde SCHEMBL17060480 0.89
Formaldehyde SCHEMBL14482091 0.89
SCHEMBL14954100 0.88
Hydrochloric Acid SCHEMBL14958379 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8058164-B2 Methods of fabricating electronic devices using direct copper plating LAM RESEARCH CORPORATION (US) 2011-11-15 US claimed
US-7931866-B2 Micelle-controlled nanoparticle synthesis for SERS INTEL CORPORATION (US) 2011-04-26 US claimed
US-7560285-B2 Micelle-controlled nanoparticle synthesis for SERS INTEL CORPORATION (US) 2009-07-14 US claimed
US-20090148675-A1 MICELLE-CONTROLLED NANOPARTICLE SYNTHESIS FOR SERS INTEL CORPORATION (US) 2009-06-11 US claimed
US-20050196870-A1 Micelle-controlled nanoparticle synthesis for SERS INTEL CORPORATION 2005-09-08 US claimed
EP-2286002-B1 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS. MICRON TECHNOLOGY INC (US) 2015-07-08 EP disclosed
US-8208241-B2 Crystallographically orientated tantalum pentoxide and methods of making same MICRON TECHNOLOGY, INC. (US) 2012-06-26 US disclosed
US-20120056325-A1 METHODS OF FABRICATING ELECTRONIC DEVICES USING DIRECT COPPER PLATING LAM RESEARCH CORPORATION 2012-03-08 US disclosed
US-8058164-B2 Methods of fabricating electronic devices using direct copper plating LAM RESEARCH CORPORATION (US) 2011-11-15 US disclosed
US-8012532-B2 Methods of making crystalline tantalum pentoxide MICRON TECHNOLOGY, INC. (US) 2011-09-06 US disclosed
US-7931866-B2 Micelle-controlled nanoparticle synthesis for SERS INTEL CORPORATION (US) 2011-04-26 US disclosed
EP-2286002-A1 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS Micron Technology, INC. (US) 2011-02-23 EP disclosed
WO-2009148799-A1 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS MICRON TECHNOLOGY, INC (US) 2009-12-10 WO disclosed
US-20090303657-A1 CRYSTALLOGRAPHICALLY ORIENTATED TANTALUM PENTOXIDE AND METHODS OF MAKING SAME MICRON TECHNOLOGY, INC. (US) 2009-12-10 US disclosed
US-20090155486-A1 METHODS OF MAKING CRYSTALLINE TANTALUM PENTOXIDE MICRON TECHNOLOGY, INC. (US) 2009-06-18 US disclosed
US-20080299772-A1 Methods of fabricating electronic devices using direct copper plating LAM RESEARCH CORPORATION 2008-12-04 US disclosed
US-7238822-B2 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2007-07-03 US disclosed
US-20060240190-A1 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2006-10-26 US disclosed