⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbon Monoxide SCHEMBL514001 | 1.00 | — | — | |
| Carbon Monoxide SCHEMBL8450099 | 1.00 | — | — | |
| Carbon Monoxide SCHEMBL4297935 | 1.00 | — | — | |
| Carbon Monoxide SCHEMBL176325 | 1.00 | — | — | |
| SCHEMBL588101 | 0.91 | — | — | |
| Carbon Monoxide SCHEMBL8008061 | 0.90 | — | — | |
| Formaldehyde SCHEMBL17060480 | 0.89 | — | — | |
| Formaldehyde SCHEMBL14482091 | 0.89 | — | — | |
| SCHEMBL14954100 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL14958379 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6063705-A | Precursor chemistries for chemical vapor deposition of ruthenium and ruthenium oxide | MICRON TECHNOLOGY, INC. (US) | 2000-05-16 | — | — | US | disclosed |
| WO-2000012776-A1 | PRECURSOR CHEMISTRIES FOR CHEMICAL VAPOR DEPOSITION OF RUTHENIUM AND RUTHENIUM OXIDE | MICRON TECHNOLOGY, INC. (US) | 2000-03-09 | — | — | WO | disclosed |