SCHEMBL176326

SCHEMBL176326

O=C=[Ru](=C=O)(=C=O)C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8008064 0.91
SCHEMBL6552545 0.79
SCHEMBL1982957 0.77
SCHEMBL17201890 0.74
SCHEMBL5349271 0.73
SCHEMBL3340330 0.68
SCHEMBL14954158 0.65
SCHEMBL14954241 0.65
SCHEMBL1448500 0.62
SCHEMBL27830046 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8058164-B2 Methods of fabricating electronic devices using direct copper plating LAM RESEARCH CORPORATION (US) 2011-11-15 US claimed
EP-2286002-B1 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS. MICRON TECHNOLOGY INC (US) 2015-07-08 EP disclosed
US-8673390-B2 Methods of making crystalline tantalum pentoxide MICRON TECHNOLOGY, INC. (US) 2014-03-18 US disclosed
US-20130011990-A1 Methods of Making Crystalline Tantalum Pentoxide MICRON TECHNOLOGY, INC. (US) 2013-01-10 US disclosed
US-8208241-B2 Crystallographically orientated tantalum pentoxide and methods of making same MICRON TECHNOLOGY, INC. (US) 2012-06-26 US disclosed
US-20120056325-A1 METHODS OF FABRICATING ELECTRONIC DEVICES USING DIRECT COPPER PLATING LAM RESEARCH CORPORATION 2012-03-08 US disclosed
US-8058164-B2 Methods of fabricating electronic devices using direct copper plating LAM RESEARCH CORPORATION (US) 2011-11-15 US disclosed
US-8012532-B2 Methods of making crystalline tantalum pentoxide MICRON TECHNOLOGY, INC. (US) 2011-09-06 US disclosed
EP-2286002-A1 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS Micron Technology, INC. (US) 2011-02-23 EP disclosed
US-20090303657-A1 CRYSTALLOGRAPHICALLY ORIENTATED TANTALUM PENTOXIDE AND METHODS OF MAKING SAME MICRON TECHNOLOGY, INC. (US) 2009-12-10 US disclosed
WO-2009148799-A1 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS MICRON TECHNOLOGY, INC (US) 2009-12-10 WO disclosed
US-20090155486-A1 METHODS OF MAKING CRYSTALLINE TANTALUM PENTOXIDE MICRON TECHNOLOGY, INC. (US) 2009-06-18 US disclosed
US-20080299772-A1 Methods of fabricating electronic devices using direct copper plating LAM RESEARCH CORPORATION 2008-12-04 US disclosed
US-7238822-B2 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2007-07-03 US disclosed
US-20060240190-A1 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2006-10-26 US disclosed