⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL176326 | 0.91 | — | — | |
| SCHEMBL6552545 | 0.71 | — | — | |
| SCHEMBL1982957 | 0.70 | — | — | |
| SCHEMBL17201890 | 0.67 | — | — | |
| SCHEMBL5349271 | 0.65 | — | — | |
| SCHEMBL11050514 | 0.65 | — | — | |
| SCHEMBL31327262 | 0.61 | — | — | |
| SCHEMBL17722417 | 0.61 | CYP3A4 (0.30) | — | |
| SCHEMBL16567890 | 0.61 | — | — | |
| SCHEMBL3340330 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6063705-A | Precursor chemistries for chemical vapor deposition of ruthenium and ruthenium oxide | MICRON TECHNOLOGY, INC. (US) | 2000-05-16 | — | — | US | disclosed |
| WO-2000012776-A1 | PRECURSOR CHEMISTRIES FOR CHEMICAL VAPOR DEPOSITION OF RUTHENIUM AND RUTHENIUM OXIDE | MICRON TECHNOLOGY, INC. (US) | 2000-03-09 | — | — | WO | disclosed |