⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2993127 | 0.73 | — | — | |
| SCHEMBL770056 | 0.73 | — | — | |
| SCHEMBL40263 | 0.71 | — | — | |
| SCHEMBL787875 | 0.71 | TDP1 (0.36) | — | |
| Ammonia Solution, Strong SCHEMBL28208580 | 0.68 | — | — | |
| SCHEMBL2967243 | 0.67 | — | — | |
| Ammonia Solution, Strong SCHEMBL845587 | 0.65 | — | — | |
| SCHEMBL13996424 | 0.65 | — | — | |
| SCHEMBL6694567 | 0.65 | ALDH1A1 (0.39) | — | |
| SCHEMBL3085782 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110122177-A1 | Ink Jet Recording Apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7896484-B2 | Ink jet recording apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-03-01 | — | — | US | disclosed |
| US-7741333-B2 | Quinazoline derivatives, their preparation, their use, and medicaments comprising them | BAYER SCHERING PHARMA AKTIENGESELLSCHAFT (DE) | 2010-06-22 | — | — | US | disclosed |
| US-20100016465-A1 | Composite Material Comprising A Water-Or Acid-Releasing Agent | DENTOFIT A/S (DK) | 2010-01-21 | — | — | US | disclosed |
| EP-2041143-A1 | QUINAZOLINE DERIVATIVES, THEIR PREPARATION, THEIR USE AS TYROSINE KINASE INHIBITORS AND MEDICAMENTS COMPRISING THEM | Bayer Schering Pharma Aktiengesellschaft (DE) | 2009-04-01 | — | — | EP | disclosed |
| US-7500745-B2 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-03-10 | — | — | US | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| EP-1996144-A2 | COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL | Dentofit A/S (DK) | 2008-12-03 | — | — | EP | disclosed |
| US-20080273066-A1 | Ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-11-06 | — | — | US | disclosed |
| US-7417074-B2 | Ink for ink jet and ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-08-26 | — | — | US | disclosed |
| EP-1514911-A1 | Ink for ink jet and ink jet recording apparatus | Toshiba Tec Kabushiki Kaisha (JP) | 2005-03-16 | — | — | EP | disclosed |
| US-20030231234-A1 | Liquid ink and recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2003-12-18 | — | — | US | disclosed |
| EP-1357159-A2 | Liquid ink and recording apparatus | Toshiba Tec Kabushiki Kaisha (JP) | 2003-10-29 | — | — | EP | disclosed |
| US-RE38256-E1 | Safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-09-23 | — | — | US | disclosed |
| US-6171733-B1 | BLEND OF ALKALI SOLUBLE PHENOLIC RESIN, ACID-CROSSLINKABLE METHYLOLATED MELAMINE, PHOTOACID GENERATOR, (POLY)OXYALKYLATED ALKANOLAMINE DISPERSANT AND BLACK PIGMENT; RESOLUTION, DISPLAY CONTRAST, COLOR FILTERS | FUJIFILM OLIN CO., LTD. (JP) | 2001-01-09 | — | — | US | disclosed |
| US-5691101-A | NONTOXIC PHOTORESISTS FOR MANUFACTURE OF CATHODE RAY TUBES AND IMAGE PICKUP DEVICES, ACID GENERATING COMPOUND WHICH CATALYZES CROSSLINKING OR DECOMPOSITION OF RESIN | KABUSHIKI KAISHA TOSHIBA (JP) | 1997-11-25 | — | — | US | disclosed |
| US-4113497-A | COMPOSITIONS WITH ORGANOHALOGEN COMPOUND AND DIAZONIUM SALTS AS PHOTOINITIATORS OF EPOXY COMPOUNDS IN PHOTO-POLYMERIZATION | AMERICAN CAN COMPANY (US) | 1978-09-12 | — | — | US | disclosed |
| US-3988152-A | Epoxy resin photoresist with iodoform and bismuth triphenyl | AMERICAN CAN COMPANY (US) | 1976-10-26 | — | — | US | disclosed |
| US-3977878-A | Epoxy resin photoresist with iodoform and bismuth triphenyl | AMERICAN CAN COMPANY (US) | 1976-08-31 | — | — | US | disclosed |
| US-3977874-A | CATIONIC CATALYST, PHOTOPOLYMERIZATION | AMERICAN CAN COMPANY (US) | 1976-08-31 | — | — | US | disclosed |