SCHEMBL1765956

SCHEMBL1765956

CO[Si](CC(O)c1ccccc1)(OC)OC

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.52
KDM4E B2RXH2 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
AOC3 Q16853 5/20 0.44
RIPK1 Q13546 1/20 0.44
TSHR P16473 1/20 0.40
GAA P10253 1/20 0.40
CYP2D6 P10635 2/20 0.39
PABPC1 P11940 1/20 0.39
APOBEC3A P31941 1/20 0.39
EIF4H Q15056 1/20 0.39
APOBEC3G Q9HC16 1/20 0.39
CYP1A2 P05177 1/20 0.39
HIF1A Q16665 1/20 0.39
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18662217 0.81 HRH1 (0.41) LMNACYP2D6CYP1A2KMT2A
SCHEMBL1765855 0.81 LMNA (0.53) LMNAKDM4EL3MBTL1AOC3RIPK1
SCHEMBL8374293 0.78 TAAR1 (0.48) AOC3RIPK1
SCHEMBL3740641 0.77 LMNA (0.58) LMNAKDM4EL3MBTL1AOC3RIPK1
SCHEMBL28198312 0.76 SCN4A (0.46)
SCHEMBL28330761 0.76 SLC6A4 (0.36) LMNAAOC3TSHRCYP2D6CYP1A2
SCHEMBL3859970 0.73 CYP1A2 (0.33) LMNAL3MBTL1TSHRCYP2D6CYP1A2
SCHEMBL27866331 0.73 TAAR1 (0.41) LMNAKDM4ETSHRCYP2D6CYP1A2
SCHEMBL485620 0.73 SMN1; SMN2 (0.33) LMNAL3MBTL1TSHRGAACYP2D6
Methoxymethane SCHEMBL12231175 0.72 LMNA (0.58) LMNAKDM4EL3MBTL1AOC3RIPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10474032-B2 Coating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-11-12 US disclosed
US-9437431-B2 Electronic device manufacture ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-09-06 US disclosed
EP-1720075-B1 Coating compositions ROHM & HAAS ELECT MAT (US) 2016-03-02 EP disclosed
US-20150072290-A1 COATING COMPOSITIONS ROHM AND HAAS ELECTRONIC MATERIALS LLC 2015-03-12 US disclosed
US-8911927-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-12-16 US disclosed
US-8889344-B2 Coating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-11-18 US disclosed
US-8263316-B2 Electronic device manufacture ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-09-11 US disclosed
US-20110123937-A1 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-05-26 US disclosed
US-7781141-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-08-24 US disclosed
US-7723850-B2 Electronic devices having air gaps ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-05-25 US disclosed
US-20050020068-A1 Plating method ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-01-27 US disclosed
EP-1479793-A2 Plating method Rohm and Haas Electronic Materials, L.L.C. (US) 2004-11-24 EP disclosed
US-20040137728-A1 Air gap formation SHIPLEY COMPANY, L.L.C. (US) 2004-07-15 US disclosed
US-20040130032-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. 2004-07-08 US disclosed
US-20040109950-A1 Dielectric materials SHIPLEY COMPANY, L.L.C. 2004-06-10 US disclosed
EP-1403925-A2 Dielectric material for electronic devices Shipley Co. L.L.C. (US) 2004-03-31 EP disclosed
US-20040052948-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. 2004-03-18 US disclosed
EP-1398831-A2 Air gaps formation Shipley Co. L.L.C. (US) 2004-03-17 EP disclosed
US-20040033700-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. (US) 2004-02-19 US disclosed
EP-1369908-A2 Methods for depositing pinhole-defect free organic polysilica coatings Shipley Company LLC (US) 2003-12-10 EP disclosed