SCHEMBL17667149

SCHEMBL17667149

O=C(O)C=CC(=O)OC1CC1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.52
HCAR2 Q8TDS4 8/20 0.46
TSHR P16473 2/20 0.43
TP53 P04637 1/20 0.43
EGLN1 Q9GZT9 1/20 0.43
EGLN3 Q9H6Z9 1/20 0.43
POLB P06746 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.36
HTT P42858 1/20 0.36
NPC1 O15118 1/20 0.36
GAA P10253 1/20 0.36
LMNA P02545 1/20 0.35
THRB P10828 1/20 0.34
CYP2C9 P11712 1/20 0.34
HRH1 P35367 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2167633 1.00 ATM (0.52) ATMHCAR2TSHRTP53EGLN1
SCHEMBL17667148 1.00 ATM (0.52) ATMHCAR2TSHRTP53EGLN1
SCHEMBL4165033 0.91 ATM (0.49) ATMHCAR2TSHRTP53EGLN1
SCHEMBL609184 0.91 ATM (0.49) ATMHCAR2TSHRTP53EGLN1
SCHEMBL26977331 0.91 ATM (0.49) ATMHCAR2TSHRTP53EGLN1
SCHEMBL528295 0.91 ATM (0.49) ATMHCAR2TSHRTP53EGLN1
SCHEMBL528296 0.91 ATM (0.49) ATMHCAR2TSHRTP53EGLN1
SCHEMBL505930 0.91 ATM (0.49) ATMHCAR2TSHRTP53EGLN1
SCHEMBL2884279 0.90 ATM (0.39) ATMHCAR2HTT
SCHEMBL2884283 0.90 ATM (0.39) ATMHCAR2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240239934-A1 FUMARIC ACID DIESTER RESIN, FILM AND POLARIZING PLATE TOSOH CORPORATION (JP) 2024-07-18 US disclosed
EP-4299283-A1 FUMARIC ACID DIESTER RESIN, FILM AND POLARIZING PLATE Tosoh Corporation (JP) 2024-01-03 EP disclosed
CN-117157337-A Fumaric acid diester resin, film and polarizing plate 东曹株式会社 2023-12-01 CN disclosed
WO-2022210589-A1 FUMARIC ACID DIESTER RESIN, FILM AND POLARIZING PLATE 東ソー株式会社 2022-10-06 WO disclosed
EP-3006494-B1 RESIN COMPOSITION, OPTICAL COMPENSATION FILM EMPLOYING SAME, AND PRODUCTION METHOD FOR SAME TOSOH CORP (JP) 2019-07-31 EP disclosed
EP-3208301-B1 RESIN COMPOSITION AND OPTICAL COMPENSATION FILM USING SAME TOSOH CORP (JP) 2019-04-03 EP disclosed
US-10126478-B2 Resin composition and optical compensation film using same TOSOH CORPORATION (JP) 2018-11-13 US disclosed
US-9932488-B2 Resin composition, optical compensation film using same, and production method for same TOSOH CORPORATION (JP) 2018-04-03 US disclosed
US-20170242174-A1 RESIN COMPOSITION AND OPTICAL COMPENSATION FILM USING SAME TOSOH CORPORATION (JP) 2017-08-24 US disclosed
EP-3208301-A1 RESIN COMPOSITION AND OPTICAL COMPENSATION FILM USING SAME Tosoh Corporation (JP) 2017-08-23 EP disclosed
US-20160115333-A1 RESIN COMPOSITION, OPTICAL COMPENSATION FILM USING SAME, AND PRODUCTION METHOD FOR SAME TOSOH CORPORATION (JP) 2016-04-28 US disclosed
EP-3006494-A1 RESIN COMPOSITION, OPTICAL COMPENSATION FILM EMPLOYING SAME, AND PRODUCTION METHOD FOR SAME Tosoh Corporation (JP) 2016-04-13 EP disclosed