Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | NMT2 | O60551 | 1/20 | 0.33 |
| ▸ | NMT1 | P30419 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.31 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.31 |
| ▸ | MMP8 | P22894 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23747271 | 0.83 | CA1 (0.40) | POLBGAAKDM4ENMT2NMT1 | |
| SCHEMBL21710132 | 0.82 | GAA (0.37) | POLBGAAKDM4ENMT2NMT1 | |
| SCHEMBL26365536 | 0.81 | SCN1A (0.35) | — | |
| SCHEMBL17717753 | 0.79 | CA1 (0.30) | CA1CA2 | |
| SCHEMBL17717747 | 0.79 | CA2 (0.40) | POLBCA1CA2ALDH1A1 | |
| SCHEMBL12619025 | 0.79 | KDM4E (0.35) | KDM4ECA1CA2ALDH1A1ADRB2 | |
| SCHEMBL13667079 | 0.77 | ALDH1A1 (0.37) | GAACA1CA2ALDH1A1 | |
| SCHEMBL16866628 | 0.77 | CA1 (0.38) | POLBCA1CA2 | |
| SCHEMBL23992744 | 0.76 | SLC7A5 (0.34) | POLBGAAKDM4ENMT2NMT1 | |
| SCHEMBL19821882 | 0.76 | MAPK1 (0.40) | GAAKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9482945-B2 | Photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-11-01 | — | — | US | disclosed |
| US-20160103393-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |