Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14983806 | 0.84 | TSHR (0.45) | TSHRALDH1A1THRB | |
| SCHEMBL22231290 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL2350471 | 0.80 | TSHR (0.41) | TSHRALDH1A1THRB | |
| SCHEMBL25561394 | 0.79 | TSHR (0.41) | TSHRALDH1A1THRB | |
| SCHEMBL2403299 | 0.79 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL7954579 | 0.78 | TSHR (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL25561395 | 0.78 | TSHR (0.40) | TSHRALDH1A1THRB | |
| SCHEMBL16291282 | 0.78 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL9165875 | 0.78 | TSHR (0.42) | TSHRALDH1A1THRB | |
| SCHEMBL8986250 | 0.78 | TSHR (0.42) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11697754-B2 | Thermal conductive layer, photosensitive layer, photosensitive composition, manufacturing method for thermal conductive layer, and laminate and semiconductor device | FUJIFILM CORPORATION (JP) | 2023-07-11 | — | — | US | disclosed |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161249-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| EP-4024131-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | FUJIFILM Corporation (JP) | 2022-07-06 | — | — | EP | disclosed |
| EP-3757676-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD THEREFOR, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-12-30 | — | — | EP | disclosed |
| WO-2020149206-A1 | METHOD FOR PRODUCING ACRYLIC RESIN FILM | コニカミノルタ株式会社 | 2020-07-23 | — | — | WO | disclosed |
| US-9639002-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9639002-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20160116843-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-04-28 | — | — | US | disclosed |
| US-20160116843-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-04-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | TSHR 1473/4885ALDH1A1 2433/4885THRB 3506/4885 |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | RER1, TERB1, TRRAP | TSHR 1470/4885ALDH1A1 2457/4885THRB 3553/4885 |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | TSHR 1473/4885ALDH1A1 2433/4885THRB 3506/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.