SCHEMBL17722902

SCHEMBL17722902

C/N=C1/c2c(ccc3ccccc23)OC1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 1/20 0.42
GPR84 Q9NQS5 1/20 0.38
MAPT P10636 3/20 0.36
KDM4E B2RXH2 4/20 0.36
ALDH1A1 P00352 3/20 0.36
CYP1A2 P05177 3/20 0.36
CYP2C19 P33261 2/20 0.36
LMNA P02545 1/20 0.36
MAPK1 P28482 1/20 0.36
CYP19A1 P11511 1/20 0.35
NPC1 O15118 1/20 0.35
GAA P10253 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
HSD17B10 Q99714 2/20 0.34
CYP2A6 P11509 2/20 0.34
TSHR P16473 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
GLA P06280 1/20 0.34
CYP2C9 P11712 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19320460 0.78 TAAR1 (0.35) TAAR1GPR84MAPTKDM4EALDH1A1
SCHEMBL14234929 0.77 TAAR1 (0.44) TAAR1GPR84MAPTKDM4EALDH1A1
SCHEMBL84231 0.75 TAAR1 (0.49) TAAR1GPR84MAPTKDM4EALDH1A1
SCHEMBL6124011 0.75 ALDH1A1 (0.38) TAAR1MAPTKDM4EALDH1A1CYP1A2
SCHEMBL6124015 0.74 GSK3B (0.33) TAAR1GPR84MAPTKDM4EALDH1A1
SCHEMBL15082831 0.72 KDM4E (0.32) TAAR1GPR84MAPTKDM4EALDH1A1
SCHEMBL6124016 0.72 MEN1 (0.36) TAAR1GPR84MAPTKDM4EALDH1A1
SCHEMBL17875139 0.72 HTT (0.41) MAPTKDM4EALDH1A1CYP1A2CYP2C19
SCHEMBL6124010 0.72 HTT (0.41) MAPTKDM4EALDH1A1CYP1A2CYP2C19
SCHEMBL15082828 0.71 MAPT (0.36) TAAR1GPR84MAPTKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2715451-B1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2016-05-04 EP disclosed