SCHEMBL6124010

SCHEMBL6124010

Cc1ccc(S(=O)(=O)O/N=C2/c3c(ccc4ccccc34)OC2C)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 4/20 0.41
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
POLB P06746 1/20 0.41
ALDH1A1 P00352 8/20 0.38
HSP90AA1 P07900 4/20 0.37
MAPT P10636 4/20 0.37
XBP1 P17861 4/20 0.37
MPI P34949 4/20 0.37
NPSR1 Q6W5P4 4/20 0.37
LMNA P02545 3/20 0.37
RAB9A P51151 3/20 0.37
TDP1 Q9NUW8 2/20 0.37
PKM P14618 2/20 0.37
MAPK1 P28482 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
HKDC1 Q2TB90 1/20 0.36
KEAP1 Q14145 1/20 0.35
NFE2L2 Q16236 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29559396 1.00 HTT (0.41) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL17875139 1.00 HTT (0.41) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL6124011 0.92 ALDH1A1 (0.38) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL15082830 0.90 HSP90AA1 (0.35) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL6124029 0.88 MEN1 (0.39) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL15082837 0.86 MEN1 (0.38) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL6124021 0.86 SMN1; SMN2 (0.38) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL6124030 0.86 ALDH1A1 (0.39) HTTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL15085467 0.85 ALDH1A1 (0.34) HTTMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL6124018 0.85 SIRT2 (0.38) HTTMEN1KMT2ASMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11827727-B2 Photo-alignment polymer, binder composition, binder layer, optical laminate, optical laminate manufacturing method, and image display device FUJIFILM CORPORATION (JP) 2023-11-28 US disclosed
US-11827727-B2 Photo-alignment polymer, binder composition, binder layer, optical laminate, optical laminate manufacturing method, and image display device FUJIFILM CORPORATION (JP) 2023-11-28 US disclosed
US-20230305403-A1 PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE FUJIFILM CORPORATION (JP) 2023-09-28 US disclosed
US-20230305403-A1 PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE FUJIFILM CORPORATION (JP) 2023-09-28 US disclosed
US-20230273360-A1 PHASE DIFFERENCE PLATE, PHASE DIFFERENCE PLATE WITH TEMPORARY SUPPORT, CIRCULARLY POLARIZING PLATE, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-20230273360-A1 PHASE DIFFERENCE PLATE, PHASE DIFFERENCE PLATE WITH TEMPORARY SUPPORT, CIRCULARLY POLARIZING PLATE, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-20230276683-A1 ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-20230276683-A1 ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-31 US disclosed
US-20230245912-A1 TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-08-03 US disclosed
US-20230245912-A1 TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-08-03 US disclosed
US-20140248556-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-09-04 US disclosed
US-8728708-B2 Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device FUJIFILM CORPORATION (JP) 2014-05-20 US disclosed
US-8728708-B2 Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device FUJIFILM CORPORATION (JP) 2014-05-20 US disclosed
US-20140087310-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-03-27 US disclosed
US-20140087310-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-03-27 US disclosed
US-20130171415-A1 PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2013-07-04 US disclosed
US-20130171415-A1 PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2013-07-04 US disclosed
WO-2013018524-A1 PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR FORMING RELIEF PATTERN, PHOTOSENSITIVE FILM, POLYIMIDE FILM, CURED RELIEF PATTERN AND METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 (JP) 2013-02-07 WO disclosed
US-20120107563-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-05-03 US disclosed
US-20120107563-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-05-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130171415-A1 PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE OXER1, OXSR1, RAD51 HTT 3417/4885MEN1 4582/4885KMT2A 607/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.