SCHEMBL17734166

SCHEMBL17734166

CCOC(=O)C(C)(CC)COC(=O)CC(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.33
CYP4A11 Q02928 2/20 0.33
POLB P06746 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
MGAM O43451 1/20 0.32
GAA P10253 1/20 0.32
SI P14410 1/20 0.32
MGAM2 Q2M2H8 1/20 0.32
PKM P14618 2/20 0.32
MMP8 P22894 1/20 0.32
ALDH1A1 P00352 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
TSHR P16473 2/20 0.31
MAPT P10636 1/20 0.31
TRPA1 O75762 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17734168 0.92 CYP4F2 (0.34) CYP4F2CYP4A11POLBNPSR1MGAM
SCHEMBL17734158 0.87 HTT (0.36) CYP4F2CYP4A11POLBNPSR1MGAM
SCHEMBL19261605 0.79 HTT (0.38) NPC1RAB9ASMN1; SMN2PPARA
SCHEMBL13546036 0.78 CYP4F2 (0.39) CYP4F2CYP4A11MGAMGAASI
SCHEMBL561802 0.78 GAA (0.44) CYP4F2CYP4A11MGAMGAASI
SCHEMBL16352643 0.78 GAA (0.42) CYP4F2CYP4A11MGAMGAASI
SCHEMBL974467 0.78 GAA (0.52) POLBMGAMGAASIMGAM2
SCHEMBL17734163 0.77 NAAA (0.38) ALDH1A1SMN1; SMN2KDM4E
SCHEMBL17734165 0.77 ALDH1A1 (0.43) ALDH1A1MEN1KMT2AMAPT
SCHEMBL18050454 0.77 ALDH1A1 (0.52) CYP4F2CYP4A11MGAMGAASI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9638997-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-05-02 US disclosed
US-20160131975-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-12 US disclosed