Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | APEX1 | P27695 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17775478 | 0.88 | THRB (0.45) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL17775479 | 0.87 | THRB (0.44) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL17779705 | 0.85 | THRB (0.42) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL20215641 | 0.80 | THRB (0.46) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL17773483 | 0.79 | THRB (0.37) | THRBTSHRALDH1A1 | |
| SCHEMBL10216885 | 0.78 | THRB (0.36) | THRBTSHRALDH1A1 | |
| SCHEMBL4568736 | 0.77 | THRB (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL17773495 | 0.76 | THRB (0.49) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2632792 | 0.76 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL26002528 | 0.76 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9563125-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20160147146-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-26 | — | — | US | disclosed |