⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17776109 | 0.99 | PDK1 (0.31) | — | |
| SCHEMBL75130 | 0.81 | PDK1 (0.36) | — | |
| SCHEMBL17776110 | 0.80 | LMNA (0.31) | — | |
| SCHEMBL9610643 | 0.80 | PDK1 (0.36) | — | |
| SCHEMBL75368 | 0.80 | PDK1 (0.39) | — | |
| SCHEMBL17776098 | 0.79 | TSHR (0.36) | — | |
| SCHEMBL776348 | 0.79 | PDK1 (0.38) | — | |
| SCHEMBL21122756 | 0.78 | EPHX1 (0.32) | — | |
| SCHEMBL17297572 | 0.77 | — | — | |
| SCHEMBL23501493 | 0.76 | EPHX1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9809669-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20160145205-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-26 | — | — | US | disclosed |