SCHEMBL17829485

SCHEMBL17829485

C=C(C)C(=O)Oc1ccc(OCC(F)(F)CC(F)(F)CNCC(F)(F)F)cc1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.39
KMT2A Q03164 3/20 0.37
ATM Q13315 1/20 0.37
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
POLB P06746 2/20 0.33
MEN1 O00255 1/20 0.33
LMNA P02545 1/20 0.33
PAX8 Q06710 1/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 2/20 0.33
CYP1A2 P05177 1/20 0.32
CYP2C9 P11712 1/20 0.32
KDM4E B2RXH2 1/20 0.31
DGAT1 O75907 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17829489 0.92 ELANE (0.39) ELANEKMT2AATMNPC1RAB9A
SCHEMBL17829483 0.82 ELANE (0.44) ELANEKMT2AATMNPC1RAB9A
SCHEMBL15426663 0.73 THRB (0.38) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL10101712 0.69 ELANE (0.50) ELANEKMT2AATMSMN1; SMN2POLB
SCHEMBL56436 0.69 ELANE (0.69) ELANEKMT2AATMRAB9ASMN1; SMN2
SCHEMBL452749 0.68 ELANE (0.56) ELANEKMT2AATMNPC1POLB
SCHEMBL11229036 0.68 POLB (0.56) ELANEKMT2AATMNPC1POLB
SCHEMBL373661 0.68 ELANE (0.51) ELANEKMT2AATMNPC1RAB9A
SCHEMBL15292838 0.68 ELANE (0.46) ELANEKMT2AATMNPC1SMN1; SMN2
SCHEMBL21469986 0.68 ELANE (0.43) ELANEKMT2AATMSMN1; SMN2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170226250-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-10 US disclosed
US-20170097567-A1 METHOD FOR PRODUCING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
US-20160229940-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed
US-20160168296-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-16 US disclosed