Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | GPR174 | Q9BXC1 | 1/20 | 0.31 |
| ▸ | DGAT1 | O75907 | 3/20 | 0.31 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17829485 | 0.92 | ELANE (0.39) | ELANEKMT2AATMMEN1LMNA | |
| SCHEMBL17829483 | 0.86 | ELANE (0.44) | ELANEKMT2AATMMEN1LMNA | |
| SCHEMBL17829484 | 0.77 | CHRNB2 (0.37) | — | |
| SCHEMBL15292838 | 0.72 | ELANE (0.46) | ELANEKMT2AATMLMNAPOLB | |
| SCHEMBL14330806 | 0.71 | ELANE (0.45) | ELANEKMT2AATMMEN1LMNA | |
| SCHEMBL12356884 | 0.70 | ELANE (0.49) | ELANEKMT2AATMLMNAPOLB | |
| SCHEMBL14330802 | 0.69 | ELANE (0.46) | ELANEKMT2AATMMEN1POLB | |
| SCHEMBL9998799 | 0.69 | ELANE (0.48) | ELANEKMT2AATMLMNAPOLB | |
| SCHEMBL12357104 | 0.69 | ELANE (0.55) | ELANEKMT2AATMMEN1POLB | |
| SCHEMBL56436 | 0.68 | ELANE (0.69) | ELANEKMT2AATMMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20160229940-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160168296-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |