SCHEMBL17829488

SCHEMBL17829488

C=Cc1ccc(NCC(F)(F)CC(F)(F)CNCC(F)(F)F)cc1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17829487 0.88 ALDH1A1 (0.31) ALDH1A1
SCHEMBL15114288 0.83 ALDH1A1 (0.37) ALDH1A1
SCHEMBL17829486 0.78 CHRNB2 (0.35) ALDH1A1
SCHEMBL15114291 0.78 ALDH1A1 (0.38) ALDH1A1
SCHEMBL15114290 0.74 ALDH1A1 (0.41) ALDH1A1
SCHEMBL18351156 0.70 ALDH1A1 (0.41) ALDH1A1
SCHEMBL17829484 0.68 CHRNB2 (0.37)
SCHEMBL11687521 0.67 ALDH1A1 (0.41) ALDH1A1
SCHEMBL12021316 0.64 ALDH1A1 (0.46) ALDH1A1
SCHEMBL15426643 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170226250-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-10 US disclosed
US-20170097567-A1 METHOD FOR PRODUCING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
US-20160229940-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed
US-20160168296-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-16 US disclosed