SCHEMBL17829500

SCHEMBL17829500

C=C(C)C(=O)Oc1ccc(O)c(CO)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.50
ELANE P08246 1/20 0.45
KMT2A Q03164 2/20 0.42
ATM Q13315 1/20 0.42
KLF10 Q13118 1/20 0.40
MTNR1A P48039 1/20 0.40
MTNR1B P49286 1/20 0.40
MMP2 P08253 2/20 0.37
MMP9 P14780 2/20 0.37
MMP8 P22894 2/20 0.37
NFKB1 P19838 1/20 0.37
PTPN1 P18031 2/20 0.37
CYP3A4 P08684 1/20 0.37
CYBB P04839 1/20 0.36
MMP13 P45452 1/20 0.36
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
ADRB3 P13945 1/20 0.35
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15495920 0.89 ELANE (0.46) PKMELANEKMT2AATMMTNR1A
SCHEMBL15495916 0.85 MTNR1A (0.44) ELANEKMT2AATMMTNR1AMTNR1B
SCHEMBL17829501 0.82 ELANE (0.41) PKMELANEKMT2AATMPTPN1
SCHEMBL26245623 0.82 ELANE (0.47) ELANEKMT2AATMPOLBTDP1
SCHEMBL31097938 0.82 ELANE (0.51) ELANEKMT2AATMCYP3A4CA1
SCHEMBL10643108 0.82 ELANE (0.51) ELANEKMT2AATMCYP3A4CA1
SCHEMBL15496033 0.80 ELANE (0.50) ELANEKMT2AATMCYP3A4CA2
SCHEMBL15495947 0.79 ELANE (0.46) PKMELANEKMT2AATMCYP3A4
SCHEMBL15388793 0.79 ELANE (0.49) ELANEKMT2AATMCYP3A4TDP1
SCHEMBL12977849 0.78 CA1 (0.54) ELANECA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10191373-B2 Method for producing polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-29 US disclosed
US-20170226250-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-10 US disclosed
US-20170226250-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-10 US disclosed
US-20170097567-A1 METHOD FOR PRODUCING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
US-20170097567-A1 METHOD FOR PRODUCING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
US-20160229940-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed
US-20160229940-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed
US-20160168296-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-16 US disclosed
US-20160168296-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-16 US disclosed