SCHEMBL17830200

SCHEMBL17830200

CCC(C)(COC(=O)C(C)(C)C)C(=O)OCCC(F)(F)CC(C)(F)F

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.30
POLB P06746 1/20 0.30
GAA P10253 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17830212 0.89
SCHEMBL17830207 0.88 PRKCA (0.33) PRKCAPOLBGAANPSR1
SCHEMBL17830201 0.87
SCHEMBL17830197 0.86
SCHEMBL17830205 0.85 PRKCA (0.33) PRKCAPOLBGAANPSR1
SCHEMBL17830186 0.83 PRKCA (0.32) PRKCA
SCHEMBL17830193 0.80 ALDH1A1 (0.37)
SCHEMBL15432460 0.79 CYP4F2 (0.34)
SCHEMBL17830199 0.78 PRKCA (0.36) PRKCANPSR1
SCHEMBL17852537 0.76 CYP4F2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed