Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | MAPT | P10636 | 3/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.48 |
| ▸ | PRKCA | P17252 | 1/20 | 0.40 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL135702 | 0.82 | ALDH1A1 (0.53) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL17830226 | 0.79 | ALDH1A1 (0.55) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL17830228 | 0.78 | ALDH1A1 (0.43) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL17830225 | 0.77 | ALDH1A1 (0.45) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL131064 | 0.76 | CYP17A1 (0.55) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL13113297 | 0.73 | MEN1 (0.33) | ALDH1A1KMT2AMEN1CYP17A1CYP19A1 | |
| SCHEMBL15453467 | 0.72 | EPHX2 (0.42) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL16731571 | 0.72 | ALDH1A1 (0.50) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL5442806 | 0.71 | NPSR1 (0.49) | ALDH1A1KMT2AMEN1MAPTNPSR1 | |
| SCHEMBL953836 | 0.71 | ALDH1A1 (0.42) | ALDH1A1KMT2AMEN1MAPTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |