SCHEMBL1784087

SCHEMBL1784087

O=P(O)(O)[CH]P(=O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3028750 0.70
SCHEMBL1375945 0.70 CA2 (0.39)
SCHEMBL4922748 0.70
SCHEMBL439474 0.70 CA2 (0.39)
Phosphoric Acid SCHEMBL3788505 0.65 CA2 (0.56)
Phosphoric Acid SCHEMBL5907 0.65 CA2 (0.56)
Phosphoric Acid SCHEMBL36090 0.65 CA2 (0.56)
Phosphoric Acid SCHEMBL8851940 0.65 CA2 (0.56)
Phosphoric Acid SCHEMBL1332284 0.65
Phosphoric Acid SCHEMBL897840 0.65 CA2 (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120094209-A1 ION-CONDUCTIVE COMPOSITE, MEMBRANE ELECTRODE ASSEMBLY (MEA), AND ELECTROCHEMICAL DEVICE SONY CORPORATION (JP) 2012-04-19 US claimed
EP-1179529-A1 NOVEL HYDROXAMIC ACID DERIVATIVES Daiichi Fine Chemical Co., Ltd. (JP) 2002-02-13 EP claimed
EP-1101492-A1 NOVEL REMEDIES FOR ALLERGIC DISEASES FUJI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) 2001-05-23 EP claimed
EP-1038864-A1 NOVEL METALLOPROTEINASE INHIBITORS FUJI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) 2000-09-27 EP claimed
US-20230109597-A1 CLEANING COMPOSITION FUJIMI INCORPORATED (JP) 2023-04-06 US disclosed
US-20210395645-A1 CLEANING LIQUID FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) 2021-12-23 US disclosed
US-11203731-B2 Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate FUJIMI INCORPORATED (JP) 2021-12-21 US disclosed
US-20210130735-A1 COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2021-05-06 US disclosed
EP-3178792-B1 METHOD OF SCALE INHIBITION ITALMATCH CHEMICALS SPA (IT) 2021-04-14 EP disclosed
US-10954479-B2 Composition for surface treatment and surface treatment method using the same FUJIMI INCORPORATED 2021-03-23 US disclosed
CN-111909197-A Preparation method of triphosphate compound and deoxynucleotide 深圳清华大学研究院 2020-11-10 CN disclosed
WO-2020195343-A1 CLEANING LIQUID 富士フイルムエレクトロニクスマテリアルズ株式会社 2020-10-01 WO disclosed
EP-1101492-A1 NOVEL REMEDIES FOR ALLERGIC DISEASES FUJI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) 2001-05-23 EP disclosed
EP-1038864-A1 NOVEL METALLOPROTEINASE INHIBITORS FUJI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) 2000-09-27 EP disclosed
US-6096919-A NEW SULPHONATED IMINE INTERMEDIATES CIBA SPECIALTY CHEMICALS CORPORATION (US) 2000-08-01 US disclosed
EP-0957085-A1 A process for the preparation of sulphonated distyryl-biphenyl compounds Ciba Spezialitätenchemie Holding AG (Ciba Spécialités Chimiques Holding SA) (Ciba Specialty Chemicals Holding Inc.) (CH) 1999-11-17 EP disclosed
US-5478476-A Preventing calcium carbonate scale formation on metal surfaces in contact with industrial process waters NALCO CHEMICAL COMPANY (US) 1995-12-26 US disclosed
US-5414112-A N-bis(phosphonomethyl) amino acids and their use as scale inhibitors NALCO CHEMICAL COMPANY (US) 1995-05-09 US disclosed
EP-0569220-A2 Stabilization of polyether polyamino methylene phosphonate scale inhibitors Calgon Corporation (US) 1993-11-10 EP disclosed
US-5215585-A Hydration retarder W. R. GRACE & CO.-CONN. (US) 1993-06-01 US disclosed