SCHEMBL17853345

SCHEMBL17853345

C=C(C)C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TGFBR1 P36897 1/20 0.34
ALDH1A1 P00352 2/20 0.33
KDM4E B2RXH2 1/20 0.33
TDP1 Q9NUW8 1/20 0.31
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25486742 0.84 CA1 (0.35) CA1CA2MAPK1SMN1; SMN2TGFBR1
SCHEMBL14477969 0.84 CA1 (0.46) CA1CA2MAPK1SMN1; SMN2EPHX1
SCHEMBL10789031 0.81 CA2 (0.52) CA1CA2MAPK1SMN1; SMN2ALDH1A1
SCHEMBL31602228 0.78 CA1 (0.41) CA1CA2MAPK1SMN1; SMN2
SCHEMBL1618240 0.77 CA2 (0.48) CA1CA2MAPK1SMN1; SMN2KDM4E
SCHEMBL18158144 0.76 CA2 (0.42) CA1CA2MAPK1SMN1; SMN2EPHX1
Methacrylic Acid SCHEMBL29082225 0.74 MAPK1 (0.42) CA1CA2MAPK1SMN1; SMN2TGFBR1
SCHEMBL4603325 0.74 TGFBR1 (0.35) TGFBR1
SCHEMBL1568523 0.74 TGFBR1 (0.35) TGFBR1ALDH1A1KDM4E
SCHEMBL3928419 0.73 CA2 (0.44) CA1CA2MAPK1SMN1; SMN2TGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119297386-A Single-ion conductor solid electrolyte, preparation method thereof and solid battery 香港科技大学 2025-01-10 CN claimed
CN-119297386-A Single-ion conductor solid electrolyte, preparation method thereof and solid battery 香港科技大学 2025-01-10 CN disclosed
WO-2023140191-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-07-27 WO disclosed
US-20160178816-A1 NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT FUJIFILM CORPORATION (JP) 2016-06-23 US disclosed
US-20160178816-A1 NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT FUJIFILM CORPORATION (JP) 2016-06-23 US disclosed