⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2748223 | 0.83 | — | — | |
| SCHEMBL10043025 | 0.81 | — | — | |
| SCHEMBL16188753 | 0.80 | PRMT3 (0.39) | — | |
| SCHEMBL11578449 | 0.79 | CYP2C9 (0.44) | — | |
| SCHEMBL6249356 | 0.78 | AOC3 (0.31) | — | |
| SCHEMBL28211595 | 0.78 | CYP2C19 (0.33) | — | |
| SCHEMBL10812684 | 0.77 | SLC22A1 (0.38) | — | |
| SCHEMBL2058529 | 0.75 | — | — | |
| SCHEMBL1285192 | 0.74 | — | — | |
| SCHEMBL11492199 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3241075-B1 | STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2024-10-16 | — | — | EP | disclosed |
| US-9914902-B2 | Stripping compositions for removing photoresists from semiconductor substrates | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2018-03-13 | — | — | US | disclosed |
| EP-3241075-A1 | STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES | FujiFilm Electronic Materials USA, Inc. (US) | 2017-11-08 | — | — | EP | disclosed |
| US-20160186106-A1 | STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2016-06-30 | — | — | US | disclosed |