Fluoride Ion

Fluoride Ion

SCHEMBL17870609

CCC[N+](CCC)(CCC)CCO.[F-]

nearest known ligand 0.62

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 4/20 0.62
DNM1 Q05193 2/20 0.44
SLC22A2 O15244 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 3/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
ALDH1A1 P00352 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TSHR P16473 1/20 0.38
CYP3A4 P08684 1/20 0.38
SLC5A7 Q9GZV3 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL992673 0.97 SLC22A1 (0.67) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
SCHEMBL14839961 0.97 SLC22A1 (0.67) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
SCHEMBL2138636 0.97 SLC22A1 (0.67) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Water SCHEMBL25183170 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Water SCHEMBL597350 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Water SCHEMBL3308149 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Bromide SCHEMBL31435645 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Bromide SCHEMBL18954325 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Water SCHEMBL27424443 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA
Hydrochloric Acid SCHEMBL9755272 0.94 SLC22A1 (0.62) SLC22A1DNM1SLC22A2SMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112480928-A Silicon etching composition and etching method for silicon substrate by using same 利绅科技股份有限公司 2021-03-12 CN claimed
CN-105733587-B Etchant solution and method of use thereof 弗萨姆材料美国有限责任公司 2020-04-03 CN claimed
US-9873833-B2 Etchant solutions and method of use thereof VERSUM MATERIALS US, LLC (US) 2018-01-23 US claimed
EP-3040397-A1 ETCHANT SOLUTIONS AND METHOD OF USE THEREOF AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-07-06 EP claimed
US-20160186058-A1 Etchant Solutions and Method of Use Thereof AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-06-30 US claimed
CN-113287187-B Hafnium Oxide Corrosion Inhibitor 弗萨姆材料美国有限责任公司 2024-12-03 CN disclosed
US-11946148-B2 Hafnium oxide corrosion inhibitor VERSUM MATERIALS US, LLC (US) 2024-04-02 US disclosed
US-20220064803-A1 Hafnium Oxide Corrosion Inhibitor VERSUM MATERIALS US, LLC (US) 2022-03-03 US disclosed
EP-3909068-A1 HAFNIUM OXIDE CORROSION INHIBITOR Versum Materials US, LLC (US) 2021-11-17 EP disclosed
CN-113287187-A Hafnium oxide corrosion inhibitors 弗萨姆材料美国有限责任公司 2021-08-20 CN disclosed
CN-112480928-A Silicon etching composition and etching method for silicon substrate by using same 利绅科技股份有限公司 2021-03-12 CN disclosed
US-9873833-B2 Etchant solutions and method of use thereof VERSUM MATERIALS US, LLC (US) 2018-01-23 US disclosed
EP-3040397-A1 ETCHANT SOLUTIONS AND METHOD OF USE THEREOF AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-07-06 EP disclosed
US-20160186058-A1 Etchant Solutions and Method of Use Thereof AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-06-30 US disclosed