Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 4/20 | 0.62 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.44 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL25183170 | 1.00 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| Water SCHEMBL3308149 | 1.00 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| SCHEMBL992673 | 0.97 | SLC22A1 (0.67) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| SCHEMBL2138636 | 0.97 | SLC22A1 (0.67) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| SCHEMBL14839961 | 0.97 | SLC22A1 (0.67) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| Bromide SCHEMBL18954325 | 0.94 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| Bromide SCHEMBL31435645 | 0.94 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| Fluoride Ion SCHEMBL17870609 | 0.94 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| Water SCHEMBL27424443 | 0.94 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA | |
| Hydrochloric Acid SCHEMBL7155406 | 0.94 | SLC22A1 (0.62) | SLC22A1DNM1SLC22A2SMN1; SMN2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 518 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250026960-A1 | POLISHING SLURRY COMPOSITION | KCTECH CO.,LTD. (KR) | 2025-01-23 | — | — | US | claimed |
| CN-118339245-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-117946812-A | Cleaning composition | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| WO-2024083019-A1 | CLEANING COMPOSITION | 安集微电子科技（上海）股份有限公司 | 2024-04-25 | — | — | WO | claimed |
| CN-117106528-A | Semiconductor substrate cleaning liquid composition | JL化学株式会社 | 2023-11-24 | — | — | CN | claimed |
| WO-2023121037-A1 | POLISHING SLURRY COMPOSITION | 주식회사 케이씨텍 | 2023-06-29 | — | — | WO | claimed |
| CN-110777381-B | Composition for TiN hardmask removal and etch residue cleaning | 弗萨姆材料美国有限责任公司 | 2022-10-04 | — | — | CN | claimed |
| CN-111825105-B | Preparation of Y molecular sieve with FAU structure by guide agent method | 中国科学院大连化学物理研究所 | 2022-08-19 | — | — | CN | claimed |
| CN-111825103-B | Fluorine-containing high-silicon Y molecular sieve and preparation method thereof | 中国科学院大连化学物理研究所 | 2022-04-12 | — | — | CN | claimed |
| CN-111825102-B | Dry glue conversion synthesis method of high-silicon Y molecular sieve | 中国科学院大连化学物理研究所 | 2022-03-22 | — | — | CN | claimed |
| EP-1610185-A2 | Composition and method using same for removing residue from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-12-28 | — | — | EP | claimed |
| EP-1027415-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | Kyzen Corporation (US) | 2000-08-16 | — | — | EP | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |
| US-5846695-A | Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-12-08 | — | — | US | claimed |
| US-5693599-A | Flux washing agent | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1997-12-02 | — | — | US | claimed |
| EP-0463423-B1 | Surface treating agent for aluminum line pattern substrate | MITSUBISHI GAS CHEMICAL CO (JP) | 1995-08-30 | — | — | EP | claimed |
| US-5174816-A | SURFACE TREATING AGENT FOR ALUMINUM LINE PATTERN SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-12-29 | — | — | US | claimed |
| EP-0463423-A1 | Surface treating agent for aluminum line pattern substrate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-01-02 | — | — | EP | claimed |
| US-4339340-A | HYDROXYLAKYL/TRIALKYLAMMONIUM HYDROXIDE | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1982-07-13 | — | — | US | claimed |
| US-4239661-A | HYDROXYALKYL TRIALKYLAMMONIUM HYDROXIDE | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1980-12-16 | — | — | US | claimed |