SCHEMBL17914404

SCHEMBL17914404

CCC(C)(CC)c1ccc(CNS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.59

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.59
PPARA Q07869 1/20 0.44
PTPN11 Q06124 1/20 0.44
CA1 P00915 5/20 0.42
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
NSD2 O96028 2/20 0.41
HDAC3 O15379 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
CNR1 P21554 1/20 0.39
EPHX1 P07099 1/20 0.39
CYP19A1 P11511 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17409185 0.89 CA2 (0.58) CA2PPARAPTPN11CA1NSD2
SCHEMBL141067 0.81 CA2 (0.65) CA2PPARACA1MEN1KMT2A
SCHEMBL20906464 0.79 CA2 (0.67) CA2PPARACA1NSD2CYP19A1
SCHEMBL138364 0.77 CA2 (0.64) CA2CA1CYP19A1KMT2A
SCHEMBL20906597 0.77 CA2 (0.59) CA2PPARACA1CNR1
SCHEMBL10262573 0.76 CA2 (0.55) CA2PPARACA1
SCHEMBL12601604 0.76 NSD2 (0.52) CA2PPARACA1NSD2CNR1
SCHEMBL17953163 0.74 CA2 (0.56) CA2PPARACA1HDAC3HDAC8
SCHEMBL7426091 0.74 CA2 (0.60) CA2PPARA
SCHEMBL904285 0.73 CA2 (0.59) CA2PPARACA1NSD2CNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9874816-B2 Radiation-sensitive resin composition and resist pattern-forming method JSR CORPORATION (JP) 2018-01-23 US disclosed
US-20170363961-A9 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-12-21 US disclosed
US-20160202608-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-07-14 US disclosed