SCHEMBL1793267

SCHEMBL1793267

FN(F)N(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL27534754 0.79 TP53 (0.38)
SCHEMBL27728304 0.67
SCHEMBL36079 0.67
Helium SCHEMBL7645253 0.60
SCHEMBL9134816 0.60
SCHEMBL6319137 0.60
SCHEMBL6841995 0.60
SCHEMBL22287293 0.60
Fluoride SCHEMBL6307522 0.60
SCHEMBL6311816 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 244 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120202322-A Semiconductor cleaning using plasma-free precursors 应用材料公司 2025-06-24 CN claimed
CN-119268032-A High-energy-efficiency air conditioner (heat pump) and method for realizing high energy efficiency 江苏海之陆水处理设备有限公司 2025-01-07 CN claimed
CN-118851281-A Fluoride and preparation method and application thereof 厦门稀土材料研究所 2024-10-29 CN claimed
WO-2024091816-A1 SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS APPLIED MATERIALS, INC. (US) 2024-05-02 WO claimed
US-20240145230-A1 SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS APPLIED MATERIALS, INC. (US) 2024-05-02 US claimed
US-11795138-B2 Process of fluorinating inorganic compounds by direct fluorination Fujian Yongjing Technology Co.,Ltd (CN) 2023-10-24 US claimed
US-20220135516-A1 Process of Fluorinating Inorganic Compounds by Direct Fluorination Fujian Yongjing Technology Co.,Ltd (CN) 2022-05-05 US claimed
US-20210053911-A1 Process of Fluorinating Inorganic or Organic Compounds by Direct Fluorination FUJIAN YONGJING TECHNOLOGY CO., LTD (CN) 2021-02-25 US claimed
WO-2021031432-A1 PROCESS OF FLUORINATING INORGANIC OR ORGANIC COMPOUNDS BY DIRECT FLUORINATION FUJIAN YONGJING TECHNOLOGY CO., LTD (CN) 2021-02-25 WO claimed
EP-3782969-A1 PROCESS OF FLUORINATING INORGANIC OR ORGANIC COMPOUNDS BY DIRECT FLUORINATION Fujian Yongjing Technology Co., Ltd. (CN) 2021-02-24 EP claimed
US-4832931-A Synthesis of tetrafluorohydrazine THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 1989-05-23 US claimed
US-4188592-A Closed cycle chemical laser UNITED TECHNOLOGIES CORPORATION (US) 1980-02-12 US claimed
US-4102988-A HYDROGEN OR DEUTERIUM FLUORIDE THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) 1978-07-25 US claimed
US-4075073-A Method for the preparation of bis(perfluoro-t butyl) peroxide THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 1978-02-21 US claimed
US-3993632-A PROPELLANT BINDER SHELL OIL COMPANY (US) 1976-11-23 US claimed
US-3992208-A Photo-sensitive etchant and method for forming metal image using same FUJI PHOTO FILM CO., LTD. (JA) 1976-11-16 US claimed
US-3968160-A Preparation of 1,2,3-tris[1,2-bis(difluoramino)ethoxy]propane ROHM AND HAAS COMPANY (US) 1976-07-06 US claimed
US-3960559-A Method of making a semiconductor device utilizing a light-sensitive etching agent FUJI PHOTO FILM CO., LTD. (JA) 1976-06-01 US claimed
US-3944448-A Thixotropic monopropellant containing inorganic phosphides or phosphide alloys THIOKOL CORPORATION (US) 1976-03-16 US claimed
US-3935117-A Photosensitive etching composition FUJI PHOTO FILM CO., LTD. (JA) 1976-01-27 US claimed