SCHEMBL17973379

SCHEMBL17973379

CCC(=O)O/N=C(/C/C(C)=N/OC(=O)CC)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 5/20 0.48
MAPT P10636 4/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
HDAC8 Q9BY41 2/20 0.41
HPGD P15428 2/20 0.41
HDAC3 O15379 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC2 Q92769 1/20 0.41
NCOR2 Q9Y618 1/20 0.41
ALDH1A1 P00352 2/20 0.40
PDCD1 Q15116 1/20 0.40
CD274 Q9NZQ7 1/20 0.40
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
KDM4E B2RXH2 2/20 0.38
AGTR1 P30556 1/20 0.38
ELANE P08246 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17973387 0.87 SMN1; SMN2 (0.51) SMN1; SMN2MAPTL3MBTL1HDAC8HPGD
SCHEMBL17973384 0.87 SMN1; SMN2 (0.51) SMN1; SMN2MAPTL3MBTL1HDAC8HPGD
SCHEMBL17973382 0.85 SMN1; SMN2 (0.64) SMN1; SMN2MAPTHDAC8ALDH1A1PDCD1
SCHEMBL2047501 0.78 PKM (0.47) SMN1; SMN2MAPTL3MBTL1HPGDALDH1A1
SCHEMBL2047499 0.78 PKM (0.47) SMN1; SMN2MAPTL3MBTL1HPGDALDH1A1
SCHEMBL17973380 0.78 RAB9A (0.46) SMN1; SMN2ALDH1A1MEN1KMT2AELANE
SCHEMBL17973376 0.75 PKM (0.45) SMN1; SMN2MAPTL3MBTL1HDAC8HPGD
SCHEMBL17973431 0.75 SMN1; SMN2 (0.50) SMN1; SMN2MAPTL3MBTL1HDAC8HPGD
SCHEMBL17973430 0.75 SMN1; SMN2 (0.50) SMN1; SMN2MAPTL3MBTL1HDAC8HPGD
SCHEMBL17973392 0.74 SMN1; SMN2 (0.50) SMN1; SMN2MAPTL3MBTL1ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016122160-A1 NOVEL DIOXIMESTER COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING SAME 주식회사 삼양사 2016-08-04 WO disclosed