SCHEMBL1800028

SCHEMBL1800028

C=C(C)C(=O)SCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL714832 0.80 TDP1 (0.38)
SCHEMBL4829176 0.79
SCHEMBL14254732 0.79 TSHR (0.39)
SCHEMBL18140323 0.78
SCHEMBL8044195 0.78
SCHEMBL3021611 0.77
SCHEMBL10312483 0.76 CYP2C19 (0.42)
SCHEMBL1802969 0.76 TDP1 (0.35)
SCHEMBL1802245 0.76 TDP1 (0.35)
SCHEMBL18927191 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4201681-B1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA INC (JP) 2025-12-10 EP disclosed
US-20240199847-A1 RESIN COMPOSITION AND ELECTRONIC DEVICE KONICA MINOLTA INC (JP) 2024-06-20 US disclosed
US-11920019-B2 Resin composition and electronic device Konica Minolta, Inc. (JP) 2024-03-05 US disclosed
CN-111989382-B Photochromic compound, curable composition containing the same, and optical article 株式会社德山 2024-01-05 CN disclosed
CN-115151549-B Photochromic cyclic compound and curable composition containing the same 株式会社德山 2023-12-19 CN disclosed
EP-4065341-B1 INKJET METHOD FOR PRODUCING A SPECTACLE LENS ZEISS CARL VISION INT GMBH (DE) 2023-11-29 EP disclosed
US-11794428-B2 Inkjet method for producing a spectacle lens CARL ZEISS VISION INTERNATIONAL GMBH (DE) 2023-10-24 US disclosed
CN-114040946-B Heat curable inkjet ink 柯尼卡美能达株式会社 2023-10-13 CN disclosed
CN-113614622-B Spectacle lens and spectacles 豪雅镜片泰国有限公司 2023-09-22 CN disclosed
CN-116507497-A Ink jet recording method and ink jet recording apparatus 柯尼卡美能达株式会社 2023-07-28 CN disclosed
US-20020022713-A1 Polythiol, polymerizable composition, resin and lens, and process for preparing thiol compound MITSUI CHEMICALS, INC. (JP) 2002-02-21 US disclosed
EP-1138670-A1 Polythiol, polymerizable composition, resin and lens, and process for preparing thiol compound Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed
EP-0875509-B1 Chromene compound TOKUYAMA CORP (JP) 2001-06-20 EP disclosed
EP-0382477-B1 Resin having a high refractive index TOKUYAMA CORP (JP) 1995-04-19 EP disclosed
US-5246989-A PHOTOCHROMIC COMPOUND, COMPOSITION AND USE THEREOF TOKUYAMA SODA KABISHIKI KAISHA (JP) 1993-09-21 US disclosed
US-5214116-A Acrylic polymers with thioester group, lenses, optical fibers, optical recording media TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1993-05-25 US disclosed
EP-0449669-A1 Photochromic compound, composition and use thereof TOKUYAMA CORPORATION (JP) 1991-10-02 EP disclosed
EP-0273710-A2 Resin having high refractive index, process for producing said resin and optical materials composed of said resin Nippon Shokubai Kagaku Kogyo Co., Ltd (JP) 1988-07-06 EP disclosed
EP-0044835-A1 CATALYSED ALTERNATING COPOLYMERISATION AND PRODUCT NATIONAL RESEARCH DEVELOPMENT CORPORATION (GB) 1982-02-03 EP disclosed
WO-1981001289-A1 CATALYSED ALTERNATING COPOLYMERISATION AND PRODUCT BAMFORD C 1981-05-14 WO disclosed