⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL714832 | 0.87 | TDP1 (0.38) | — | |
| SCHEMBL6131318 | 0.86 | NOS3 (0.41) | — | |
| SCHEMBL1573894 | 0.82 | CES2 (0.48) | — | |
| SCHEMBL28605940 | 0.82 | CES2 (0.48) | — | |
| SCHEMBL1802245 | 0.82 | TDP1 (0.35) | — | |
| SCHEMBL1802969 | 0.82 | TDP1 (0.35) | — | |
| SCHEMBL9794648 | 0.80 | — | — | |
| SCHEMBL14254731 | 0.80 | CES2 (0.35) | — | |
| SCHEMBL1800475 | 0.80 | CES2 (0.35) | — | |
| Ethylene Glycol SCHEMBL3139524 | 0.80 | TDP1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0592934-A2 | High-refraction plastic | RÖHM GMBH (DE) | 1994-04-20 | — | — | EP | claimed |
| US-8524116-B2 | Multilayer sheet containing optically anisotropic layer containing liquid crystal compound and cellulose ester with polymer | FUJIFILM CORPORATION (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8436069-B2 | Ink composition | FUJIFILM CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20100249261-A1 | INK COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20090137773-A1 | Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers | ASEPSIS, INC. | 2009-05-28 | — | — | US | disclosed |
| US-20080213692-A1 | RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS | JSR CORPORATION (JP) | 2008-09-04 | — | — | US | disclosed |
| US-7374799-B2 | Radiation sensitive composition, microlens, process for forming microlens and use of the microlens | JSR CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080108785-A1 | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-05-08 | — | — | US | disclosed |
| US-20080009655-A1 | Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-01-10 | — | — | US | disclosed |
| US-20070282115-A1 | Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Foams, and Foam Stabilizers | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-12-06 | — | — | US | disclosed |
| US-20070161537-A1 | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers | GREAT LAKES CHEMICAL CORPORATION (US) | 2007-07-12 | — | — | US | disclosed |
| US-20070149437-A1 | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-06-28 | — | — | US | disclosed |
| US-20050157399-A1 | Radiation sensitive composition, microlens, process for forming microlens and use of the microlens | JSR CORPORATION (JP) | 2005-07-21 | — | — | US | disclosed |
| EP-1548497-A1 | Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens | JSR Corporation (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-5976517-A | Hair care composition including at least one silicone polymer grafted by anionic, amphoteric or non-ionic monomers, and at least one amphoteric polymer | L'OREAL (FR) | 1999-11-02 | — | — | US | disclosed |