Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12130504 | 0.87 | CYP4F2 (0.36) | CYP4F2CYP4A11 | |
| SCHEMBL20276245 | 0.87 | CYP4F2 (0.34) | CYP4F2CYP4A11 | |
| SCHEMBL15270593 | 0.87 | CYP4F2 (0.34) | CYP4F2CYP4A11CYP3A4CYP2D6 | |
| SCHEMBL4400245 | 0.85 | CYP4F2 (0.37) | CYP4F2CYP4A11CYP3A4CYP2D6 | |
| SCHEMBL15356149 | 0.85 | CYP4F2 (0.33) | CYP4F2CYP4A11 | |
| SCHEMBL4560373 | 0.84 | CYP3A4 (0.32) | CYP3A4CYP2D6 | |
| SCHEMBL111853 | 0.84 | CYP4F2 (0.33) | CYP4F2CYP4A11 | |
| SCHEMBL107666 | 0.83 | CYP4F2 (0.36) | CYP4F2CYP4A11 | |
| SCHEMBL13129215 | 0.83 | ALDH1A1 (0.35) | CYP4F2CYP4A11 | |
| SCHEMBL26487781 | 0.83 | CYP4F2 (0.32) | CYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |