SCHEMBL18016204

SCHEMBL18016204

CC(C)(C)c1cc(Cl)c2c(c1)C(=O)OC2=O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ PLA2G1B P04054 1/20 0.37
▸ NFKB1 P19838 1/20 0.37
▸ CASP3 P42574 1/20 0.37
▸ RAB9A P51151 1/20 0.37
▸ NFKB2 Q00653 1/20 0.37
▸ RELA Q04206 1/20 0.37
▸ SENP8 Q96LD8 1/20 0.37
▸ SENP7 Q9BQF6 1/20 0.37
▸ SENP6 Q9GZR1 1/20 0.37
▸ L3MBTL1 Q9Y468 1/20 0.37
▸ ATG4B Q9Y4P1 1/20 0.37
▸ TSHR P16473 1/20 0.34
▸ TYMS P04818 1/20 0.33
▸ GABBR2 O75899 1/20 0.32
▸ GABBR1 Q9UBS5 1/20 0.32
▸ ACLY P53396 1/20 0.32
▸ ALOX15 P16050 1/20 0.31
▸ TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18016208 0.79 NPC1 (0.37) ALDH1A1NPC1PLA2G1BNFKB1CASP3
SCHEMBL18016212 0.79 ALDH1A1 (0.37) ALDH1A1NPC1PLA2G1BNFKB1CASP3
SCHEMBL18016205 0.79 HDAC4 (0.41) ALDH1A1NPC1PLA2G1BNFKB1CASP3
SCHEMBL18016210 0.79 NPC1 (0.37) ALDH1A1NPC1PLA2G1BNFKB1CASP3
SCHEMBL855916 0.77 ALDH1A1 (0.42) ALDH1A1NPC1RAB9AL3MBTL1TSHR
SCHEMBL18016203 0.74 PON1 (0.40) ALDH1A1NPC1PLA2G1BNFKB1CASP3
SCHEMBL23198934 0.72 TSHR (0.38) ALDH1A1TSHRTYMSALOX15TDP1
SCHEMBL17726764 0.72 TYMS (0.42) ALDH1A1NPC1PLA2G1BNFKB1CASP3
SCHEMBL855592 0.72 ALDH1A1 (0.38) ALDH1A1TSHRTYMSALOX15TDP1
SCHEMBL1545970 0.69 ALDH1A1 (0.60) ALDH1A1NPC1PLA2G1BNFKB1CASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448480-B2 Resist underlayer film formation composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-09-20 — — US disclosed
US-9448480-B2 Resist underlayer film formation composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-09-20 — — US disclosed
US-20160238936-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-18 — — US disclosed
US-20160238936-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-18 — — US disclosed
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