SCHEMBL18016205

SCHEMBL18016205

CC(C)(C)c1cc(O)c2c(c1)C(=O)OC2=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HDAC4 P56524 1/20 0.41
▸ HDAC2 Q92769 1/20 0.41
▸ HDAC8 Q9BY41 1/20 0.41
▸ ALDH1A1 P00352 4/20 0.38
▸ ALOX15 P16050 4/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38
▸ HPGD P15428 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38
▸ GABRA1 P14867 1/20 0.38
▸ GABRB2 P47870 1/20 0.38
▸ NPC1 O15118 1/20 0.37
▸ PLA2G1B P04054 1/20 0.37
▸ NFKB1 P19838 1/20 0.37
▸ CASP3 P42574 1/20 0.37
▸ RAB9A P51151 1/20 0.37
▸ NFKB2 Q00653 1/20 0.37
▸ RELA Q04206 1/20 0.37
▸ SENP8 Q96LD8 1/20 0.37
▸ SENP7 Q9BQF6 1/20 0.37
▸ SENP6 Q9GZR1 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18016210 0.79 NPC1 (0.37) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL18016204 0.79 ALDH1A1 (0.37) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL18016212 0.79 ALDH1A1 (0.37) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL18016208 0.79 NPC1 (0.37) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL31634580 0.75 BCL2 (0.50) ALDH1A1ALOX15TDP1HPGDHSD17B10
SCHEMBL14007404 0.73 GABRA1 (0.57) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL21055664 0.73 MEN1 (0.40) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL30782182 0.73 KDM4E (0.37) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL17726764 0.72 TYMS (0.42) HDAC4HDAC2HDAC8ALDH1A1ALOX15
SCHEMBL11390985 0.71 KDM4E (0.53) ALDH1A1ALOX15HPGDNFKB1NFKB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448480-B2 Resist underlayer film formation composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-09-20 — — US disclosed
US-9448480-B2 Resist underlayer film formation composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-09-20 — — US disclosed
US-20160238936-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-18 — — US disclosed
US-20160238936-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-18 — — US disclosed
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