Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 1/20 | 0.48 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | LPAR1 | Q92633 | 5/20 | 0.37 |
| ▸ | LPAR3 | Q9UBY5 | 5/20 | 0.37 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9549355 | 1.00 | DNM1 (0.48) | DNM1SPHK1THRBTSHRLPAR1 | |
| SCHEMBL10867602 | 0.87 | SPHK1 (0.43) | DNM1SPHK1THRBLPAR1LPAR3 | |
| SCHEMBL7796954 | 0.85 | SPHK1 (0.41) | DNM1SPHK1THRBLPAR1LPAR3 | |
| SCHEMBL28798377 | 0.84 | SPHK1 (0.47) | DNM1SPHK1THRBTSHRLPAR1 | |
| SCHEMBL4602671 | 0.84 | SPHK1 (0.47) | DNM1SPHK1THRBTSHRLPAR1 | |
| SCHEMBL9807770 | 0.84 | SPHK1 (0.47) | DNM1SPHK1THRBTSHRLPAR1 | |
| SCHEMBL10726362 | 0.84 | DNM1 (0.47) | DNM1SPHK1THRBTSHRLPAR1 | |
| SCHEMBL4604464 | 0.84 | SPHK1 (0.47) | DNM1SPHK1THRBTSHRLPAR1 | |
| SCHEMBL537920 | 0.82 | DNM1 (0.45) | DNM1SPHK1THRBTSHRLPAR1 | |
| Hydrochloric Acid SCHEMBL7902390 | 0.82 | DNM1 (0.50) | DNM1SPHK1THRBTSHRLPAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11687003-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-20190004426-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-10073344-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2018-09-11 | — | — | US | disclosed |
| US-20160299432-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2016-10-13 | — | — | US | disclosed |