⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11989209 | 0.60 | — | — | |
| SCHEMBL12753597 | 0.58 | — | — | |
| SCHEMBL11989123 | 0.57 | MGAM (0.31) | — | |
| SCHEMBL14593264 | 0.54 | — | — | |
| SCHEMBL18022211 | 0.53 | — | — | |
| SCHEMBL13683696 | 0.51 | MGAM (0.31) | — | |
| SCHEMBL11989205 | 0.50 | — | — | |
| SCHEMBL21864893 | 0.50 | — | — | |
| SCHEMBL13492001 | 0.49 | — | — | |
| SCHEMBL14018841 | 0.48 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1580598-B1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORP (JP) | 2016-10-12 | — | — | EP | disclosed |