SCHEMBL11989209

SCHEMBL11989209

CC12COC3C(O)C(C1)OC32

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11989123 0.62 MGAM (0.31) —
SCHEMBL5621274 0.61 — —
SCHEMBL18133292 0.60 — —
SCHEMBL15520286 0.54 — —
SCHEMBL14018841 0.53 — —
SCHEMBL23081620 0.52 THRB (0.42) —
SCHEMBL24721682 0.51 KCNA4 (0.30) —
SCHEMBL21297678 0.51 — —
SCHEMBL28222836 0.51 — —
SCHEMBL20643267 0.49 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8247166-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-21 — — US disclosed
US-20100062380-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 — — US disclosed
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