Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFE2L2 | Q16236 | 3/20 | 0.61 |
| ▸ | NFKB1 | P19838 | 3/20 | 0.61 |
| ▸ | JUN | P05412 | 1/20 | 0.61 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.59 |
| ▸ | TFEB | P19484 | 1/20 | 0.53 |
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.50 |
| ▸ | F3 | P13726 | 2/20 | 0.50 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | RECQL | P46063 | 1/20 | 0.50 |
| ▸ | PLIN5 | Q00G26 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | ABHD5 | Q8WTS1 | 1/20 | 0.50 |
| ▸ | GSR | P00390 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL613718 | 0.85 | NFKB1 (0.62) | NFE2L2NFKB1JUNMAPTLMNA | |
| SCHEMBL15941356 | 0.85 | PTPN1 (0.45) | NFE2L2NFKB1JUNHSD11B1TFEB | |
| SCHEMBL29913492 | 0.85 | PTPN1 (0.45) | NFE2L2NFKB1JUNHSD11B1TFEB | |
| SCHEMBL613719 | 0.85 | NFKB1 (0.62) | NFE2L2NFKB1JUNMAPTLMNA | |
| SCHEMBL30686188 | 0.85 | NFKB1 (0.62) | NFE2L2NFKB1JUNMAPTLMNA | |
| SCHEMBL1000978 | 0.85 | NFKB1 (0.62) | NFE2L2NFKB1JUNMAPTLMNA | |
| Hydrochloric Acid SCHEMBL28511355 | 0.83 | NFKB1 (0.60) | NFE2L2NFKB1JUNMAPTLMNA | |
| SCHEMBL12569874 | 0.83 | MAPT (0.63) | NFE2L2NFKB1JUNHSD11B1TFEB | |
| SCHEMBL31310317 | 0.83 | MAPT (0.63) | NFE2L2NFKB1JUNHSD11B1TFEB | |
| SCHEMBL7101080 | 0.80 | MAPT (0.58) | NFKB1MAPTLMNAPLIN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 839 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230051188-A1 | COMPOSITION INCLUDING UNSATURATED POLYESTER RESIN, EPOXY RESIN, AND PHOTOINITIATOR AND METHOD OF USING THE SAME | 3M INNOVATIVE PROPERTIES COMPANY | 2023-02-16 | — | — | US | claimed |
| EP-4077413-A1 | COMPOSITION INCLUDING UNSATURATED POLYESTER RESIN, EPOXY RESIN, AND PHOTOINITIATOR AND METHOD OF USING THE SAME | 3M Innovative Properties Company (US) | 2022-10-26 | — | — | EP | claimed |
| US-11370944-B2 | UV curable epoxy/acrylate adhesive composition | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2022-06-28 | — | — | US | claimed |
| CN-110023073-B | Multi-layer adhesive articles | 3M创新有限公司 | 2021-09-17 | — | — | CN | claimed |
| WO-2021124114-A1 | COMPOSITION INCLUDING UNSATURATED POLYESTER RESIN, EPOXY RESIN, AND PHOTOINITIATOR AND METHOD OF USING THE SAME | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2021-06-24 | — | — | WO | claimed |
| EP-3802722-A1 | ACRYLIC-EPOXY ADHESIVE COMPOSITION | 3M Innovative Properties Company (US) | 2021-04-14 | — | — | EP | claimed |
| CN-112218927-A | Acrylic-epoxy adhesive composition | 3M创新有限公司 | 2021-01-12 | — | — | CN | claimed |
| EP-2561014-B1 | USE OF RADIATION CURABLE COMPOSITIONS AND METHOD AND KITS UTILISING THE SAME | 3M INNOVATIVE PROPERTIES CO (US) | 2020-12-09 | — | — | EP | claimed |
| US-20200270492-A1 | UV CURABLE EPOXY/ACRYLATE ADHESIVE COMPOSITION | 3M INNOVATIVE PROPERTIES CO (US) | 2020-08-27 | — | — | US | claimed |
| CN-107709497-B | UV curable epoxy/acrylate adhesive compositions | 3M创新有限公司 | 2020-07-17 | — | — | CN | claimed |
| US-20030166737-A1 | Ternary photoinitiator system for cationically polymerizable resins | 3M DEUTSCHLAND GMBH (DE) | 2003-09-04 | — | — | US | claimed |
| US-20030139484-A1 | Multiphoton photosensitization system | 3M INNOVATIVE PROPERTIES COMPANY | 2003-07-24 | — | — | US | claimed |
| WO-2003059295-A1 | TERNARY PHOTOINITIATOR SYSTEM FOR CATIONICALLY POLYMERIZABLE RESINS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2003-07-24 | — | — | WO | claimed |
| WO-2003058346-A1 | MULTIPHOTON PHOTOSENSITIZATION SYSTEM | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2003-07-17 | — | — | WO | claimed |
| US-6017660-A | PIGMENTED INK COMPRISING ADDITION POLYMER MONOMER, PHOTOINITATOR MIXTURE CONTAINING A DIARYLIODONIUM SALT, SENSITIZER FOR 2-METHYL-4,6-BIS(TRICHLOROMETHYL)-S-TRIAZINE, AND ELECTRON DONOR COMPOUND; PHOTOCURABLE | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-01-25 | — | — | US | claimed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| EP-0290133-B1 | Ternary photoinitiator system for addition polymerization | MINNESOTA MINING & MFG (US) | 1998-10-28 | — | — | EP | claimed |
| US-5545676-A | CURING MORE RAPIDLY AND DEEPLY UNDER UV OR VISIBLE LIGHT USING AN ARYLIODONIUM SALT, A PHOTOSENSITIZER AND AN ELECTRON DONOR; DENTAL ADHESIVE; PHOTORESISTS; BINDER FOR ABRASIVES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-08-13 | — | — | US | claimed |
| EP-0369645-A1 | Triazine photoinitiators in a ternary system for addition polymerization | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-05-23 | — | — | EP | claimed |
| EP-0290133-A2 | Ternary photoinitiator system for addition polymerization | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-11-09 | — | — | EP | claimed |