⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6367141 | 0.80 | — | — | |
| SCHEMBL119836 | 0.79 | — | — | |
| SCHEMBL6367684 | 0.74 | SLC6A4 (0.34) | — | |
| SCHEMBL6368066 | 0.73 | SLC6A4 (0.34) | — | |
| SCHEMBL18269894 | 0.71 | ADORA3 (0.33) | — | |
| SCHEMBL6367123 | 0.71 | ADORA3 (0.33) | — | |
| SCHEMBL18068643 | 0.71 | ADORA3 (0.33) | — | |
| SCHEMBL18176987 | 0.70 | ADORA3 (0.33) | — | |
| SCHEMBL17789336 | 0.70 | ADORA3 (0.33) | — | |
| SCHEMBL18176977 | 0.70 | ADORA3 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9952509-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-04-24 | — | — | US | disclosed |
| US-20180081271-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20160313645-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |