SCHEMBL18179357

SCHEMBL18179357

CC(C)(c1ccccc1)c1ccc(Oc2cccc(Oc3ccc(C4(c5ccc(Oc6cccc(Oc7ccc(C(C)(C)c8ccccc8)cc7)c6C#N)cc5)c5ccccc5-c5ccccc54)cc3)c2C#N)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.35
MAPT P10636 3/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
KDM4E B2RXH2 3/20 0.35
LMNA P02545 2/20 0.35
OPRK1 P41145 1/20 0.35
HSD11B1 P28845 1/20 0.34
POLB P06746 2/20 0.34
GAA P10253 1/20 0.34
SLC6A4 P31645 1/20 0.33
ALDH1A1 P00352 3/20 0.32
HPGD P15428 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
AR P10275 1/20 0.32
RIPK1 Q13546 1/20 0.32
MAOA P21397 1/20 0.31
NPC1 O15118 1/20 0.31
CRHBP P24387 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18179336 0.99 SMN1; SMN2 (0.34) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL15760413 0.92 ESR1 (0.34) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL18179329 0.92 AR (0.33) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL13250812 0.91 MAPT (0.43) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL14264198 0.91 MAPT (0.43) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL13250809 0.90 MAPT (0.40) MAPTHSD11B1SLC6A4ARMCL1
SCHEMBL15760408 0.83 ESR1 (0.40) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL15760417 0.82 AR (0.37) SMN1; SMN2MAPTMEN1KMT2AKDM4E
SCHEMBL17808971 0.81 AR (0.37) SMN1; SMN2MAPTPOLBARESR1
SCHEMBL12433514 0.80 MAPT (0.50) SMN1; SMN2MAPTMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9958781-B2 Method for film formation, and pattern-forming method JSR CORPORATION (JP) 2018-05-01 US disclosed
US-9958781-B2 Method for film formation, and pattern-forming method JSR CORPORATION (JP) 2018-05-01 US disclosed
US-9620378-B1 Composition for film formation, film, production method of patterned substrate, and compound JSR CORPORATION (JP) 2017-04-11 US disclosed
US-9620378-B1 Composition for film formation, film, production method of patterned substrate, and compound JSR CORPORATION (JP) 2017-04-11 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed