SCHEMBL18199022

SCHEMBL18199022

CCC(C)(C)C(=O)OC(CCC(F)(F)CC(F)(F)F)CC1CCCC1

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.32
CTSK P43235 6/20 0.32
CTSS P25774 1/20 0.32
CTSL P07711 1/20 0.31
CTSB P07858 1/20 0.31
CTSH P09668 1/20 0.31
FKBP1A P62942 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18198992 0.99 CTSK (0.33) HMGCRCTSKCTSSCTSLCTSB
SCHEMBL14769070 0.85 HMGCR (0.33) HMGCRCTSKCTSSCTSLCTSB
SCHEMBL18198997 0.81
SCHEMBL18199016 0.81 FKBP1A (0.36) HMGCRFKBP1A
SCHEMBL18199020 0.80 FKBP1A (0.37) HMGCRFKBP1A
SCHEMBL15836516 0.80 CTSK (0.30) CTSKCTSSCTSLCTSBCTSH
SCHEMBL25631164 0.79 CA1 (0.33) CTSK
SCHEMBL18199000 0.79
SCHEMBL15836517 0.79 CTSK (0.32) CTSKCTSSCTSLCTSBCTSH
SCHEMBL16746672 0.78 CTSK (0.44) HMGCRCTSKCTSSCTSLCTSB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20160320699-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed